Asml Netherlands B.v.

Asml Holding N.v.

Ralph Joseph Meijers

Michel Riepen

Fabrizio Evangelista

Johannes Catharinus Hubertus Mulkens

Nicolaas Rudolf Kemper

Rogier Hendrikus Magdalena Cortie

Sjoerd Nicolaas Lambertus Donders

Martinus Hendrikus Antonius Leenders

Raymond Wilhelmus Louis Lafarre

Harry Sewell

Marco Koert Stavenga

Sergei Shulepov

Erik Henricus Egidius Catharina Eummelen

Koen Steffens

Paulus Martinus Maria Liebregts

Erik Theodorus Maria Bijlaart

Marinus Jochemsen

Louis John Markoya

David Bessems

Richard Moerman

Gert-Jan Gerardus Johannes Thomas Brands

Pieter Lein Joseph Gunter

Diane Czop McCafferty

Jan Willem Cromwijk

Hua Li

Erik Witberg

Franciscus Wilhelmus Bell

Marcus Agnes Johannes Smits

Zhenhua Ma

A liquid handling structure for a lithographic apparatus comprises a droplet controller configured to allow a droplet of immersion liquid to be lost from the structure and to prevent the droplet from colliding with the meniscus of the confined immersion liquid. The droplet controller may comprise gas knives arranged to overlap to block an incoming droplet. There may be extraction holes lined up with gaps between gas knives to extract liquid that passes through the gap. A droplet is allowed to escape through the gaps.

Lithographic apparatus and a method of manufacturing a device using a lithographic apparatus

A fluid handling structure is provided for a lithographic apparatus having at a boundary between a space containing immersion fluid and a region external to the fluid handling structure, a plurality of openings arranged in a first line, a first gas knife device having an aperture in a second line, one or more openings in a third line and a second gas knife device having an aperture in a fourth line.

Fluid handling structure, lithographic apparatus and device manufacturing method, involving gas supply

A system is disclosed to isolate an environmental chamber of an immersion lithographic apparatus, to which an immersion fluid comprising liquid, is provided from an external environment. Further, there is disclosed a system for measuring flow rate and/or vapor concentration of a gas using a transducer to send and/or receive an acoustic signal.

Re-flow and buffer system for immersion lithography

A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.

Lithographic apparatus, a method of controlling the apparatus and a device manufacturing method

Growing community of inventors

Kerkrade, Netherlands

Ralph Joseph Meijers