Anicon, Inc.

Nanometrics Inc.

Quester Technology, Inc.

Ralph F Manriquez

Dale R Dubois

Bryant A Campbell

Nicholas E Miller

Giovanni Antonio Foggiato

Ashraf R Khan

Leonid V Velikov

Ultraviolet and vacuum ultraviolet radiators for use in the manufacture of semiconductors are provided which have improved lifetimes, improved distribution of radiation generation, improved distribution of emitted radiation, increased efficiency of radiation emission, and improved means for cooling. The radiators have novel electrodes, novel electrode configurations, novel means for distributing plasmas between electrodes, and have novel cooling means. These features enable the miniaturization of the radiators permitting high-intensity and uniform radiation exposure of planar surfaces. The radiators are used in the pre-treatment of semiconductor surfaces, the deposition of semiconductor thin films, and the post-deposition processing of semiconductor thin films.

Large area silent discharge excitation radiator

An improved chemical vapor deposition device having heating means substantially surrounding an inner deposition chamber for providing isothermal or precisely controlled gradient temperature conditions therein. The internal components of the chamber are quartz or similar radiant energy transparent material. Also included are special cooling means to protect thermally sensitive seals, structural configurations strengthening areas of glass components subjected to severe stress during operation, and specific designs permitting easy removal and replacement of all glass components exposed to deposition gas.

Chemical vapor deposition apparatus

A controlled temperature deposition device comprising an inner reaction chamber having gas distribution means for introducing gas into inner chamber and removing gas therefrom and a vacuum chamber means surrounding the inner deposition chamber and spaced from the walls thereof for maintaining a medium vacuum therein. Associated with the deposition device is a substrate loading and unloading fork which transfers substrates such as wafer boats from outside the device to a position in the inner deposition chamber and removes them from the inner deposition chamber following deposition.

Substrate loading means for a chemical vapor deposition apparatus

A manually operable mechanism for attachment to the adjustable stage of an inspection microscope for lifting a selected printed circuit wafer from its slot in a conventional disc holder and positioning it under the microscope lens for inspection. After inspection the mechanism is operated to lift the wafer from its inspection position, to transport it back into the disc holder, and carefully lower it into its correct slot. There is no manual handling of the wafers and therefore the normal losses resulting from breakage and contamination is eliminated.

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Saratoga, CA, United States of America

Ralph F Manriquez