Suss Microtec Lithography Gmbh

Ralph Beyer

By means of the device for coating a substrate () according to the present invention, a homogeneous coating of the substrate () can be achieved. The device comprises a holding and rotating means for holding and rotating the substrate () about an axis (A). A disk () is provided below the substrate (). Said disk () is arranged coaxially with respect to the substrate (), has at least the same diameter as the substrate () and is able to rotate synchronously with the substrate (). By means of the disk (), air swirls at the edge of and below the substrate () are avoided during coating of the substrate (). Thus, it is possible to obtain a homogeneous coating. For being able to load and unload a substrate () into and out of the device by means of a conventional gripper system (), the distance between substrate () and disk () is increased during loading and unloading.

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Mühlacker, Germany

Ralph Beyer