Shin-etsu Quartz Products Co., Ltd.

Heraeus Quarzglas Gmbh

Heraeus Quarzglas Gmbh & Co Kg

Heraeus Quarzschmelze Gmbh

Ralf Takke

Shigeru Yamagata

Kyoichi Inaki

Heinz Fabian

Stephan Thomas

Toshikatu Matsuya

Karlheinz Rau

Fritz Simmat

Uwe Christiansen

Wolfgang Englisch

Bodo Kuehn

Anton Steinkohl

Bodo Kühn

Albert Muhlich

Bruno Uebbing

Rainer Koeppler

Hans-Ulrich Bonewitz

Rainer Köppler

Dieter Ross

Michiyou Kuriyama

Karl-Friedrich Klein

Wolfgang Ruffing

The present invention relates to a quartz glass blank for an optical component for transmitting radiation of a wavelength of 15 nm and shorter, the blank consisting of highly pure quartz glass, doped with titanium and/or fluorine, which is distinguished by an extremely high homogeneity. The homogeneity relates to the following features: Said quartz glass blank can only be obtained in that a doped quartz glass obtained by flame hydrolysis of a compound containing silicon, titanium and/or fluorine is formed as a large volume rod-shaped starting body into a homogeneous quartz glass blank using several forming steps and is homogenized.

Quartz glass blank and method for producing said blank

This invention relates to an optical member made of highly transparent, high-purity synthetic silica glass, to a method for manufacturing a blank or an optical member of such glass, and to the optical members themselves. The optical members have an absolute refractive index, n.sub.d, of 1.460 or more and a hydrogen molecule concentration of at least 5.times.10.sup.16 molecules/cm.sup.3 uniformly distributed throughout the glass and are particularly well suited for use in apparatus in which they are exposed to a high-power laser beam such as that produced by an excimer laser.

Optical member made of high-purity and transparent synthetic silica

The invention relates to lenses, prisms or other optical members which are subjected to high-power ultraviolet light having a wavelength of about 360 nm or less, or ionizing radiation, particularly optical members for use in laser exposure apparatus for lithography, and to blanks for such optical members. The homogeneity of the refractive index distribution and the resistance to optical deterioration when the optical members are exposed for a long period of time to short wavelength ultraviolet light from a laser beam are improved. The optical members are made of high-purity synthetic silica glass material containing at least about 50 wt. ppm of OH groups, and are doped with hydrogen. The refractive index distribution caused by the fictive temperature distribution during heat treatment in the process of producing high-purity silica glass blanks for optical members in accordance with the present invention is offset by the combined refractive index distribution determined by the OH group concentration distribution or by the OH group concentration distribution and the Cl concentration distribution in the glass.

Optical members and blanks of synthetic silica glass and method for

Optical members and blanks or synthetic silica glass and method for

Disclosed is a method for the axial building up, in a vertical arrangement, of a hollow cylindrical soot body having no internal support and consisting substantially of silicon dioxide by means of at least one flame hydrolysis build-up burner serving for the soot production. In this method the soot is deposited at the beginning of the build-up onto an auxiliary body, and during the build-up the build-up burner and the growing soot body are rotated relative to one another, and the burner is at the same time held at an unvarying distance from the growing end of the hollow cylinder and centrally above the predetermined cross section of the upwardly growing end of the cylinder wall. The penetration of soot into the interior of the cylinder is prevented by means of a directed gas stream.

Method for the continuous building of a hollow cylindrical soot body

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Hanau, Germany

Ralf Takke