Suss Microtec Lithography Gmbh

Karl Suss America, Inc.

Ralf Süss

Seth A Wright

Walter Bohler

Robert Harrison Macklin

Richard Buttinger

Nikolaus Maier

Thomas M Price

The present invention provides a device for aligning masks in photolithography, wherein in a first mask holder for a first mask at least one adapter for a second mask can be provided, so that masks being adapted to either the first mask holder or to the at least one adapter can be used in the device. The invention is advantageous in that it allows an easy, time and cost saving changeover from one mask size to at least one different mask size.

Device for aligning masks in photolithography

A probe system for probing a device under test (DUT) includes a DUT support chuck for holding the DUT. A plurality of flexible probe needles are positioned along a 'Z' axis that extends orthogonally from the surface of the DUT. Each probe needle is movable with respect to the DUT support chuck. A motor provides for relative movement, at least along the Z axis, between the probe needles and the DUT support chuck. A variable focus imaging system is positioned along the Z axis and provides image signals to a control processor. The control processor causes the variable focus imaging system to image the surface of the DUT and at least one probe needle. The control processor is responsive to a determined distance between focal planes containing the DUT surface and probe needle to cause the motor to move the probe needle and the DUT surface into physical engagement. The motor is further controlled to provide a relative movement distance between the probe needle and the DUT that is greater than the determined distance between the focal planes, thereby enabling a predetermined contact pressure to be obtained.

Probe system with automatic control of contact pressure and probe

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Munich, Germany

Ralf Süss