Atotech Deutschland Gmbh

Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.V.

Atotech Deutschland Gmbh & Co. Kg

Ralf Schmidt

Josef Gaida

Jens Palm

Himendra Jha

Dirk Rohde

Olivier Mann

Angela Llavona-Serrano

Frank Von Horsten

Kun Si

Onas Bolton

Andreas Ostmann

Lothar Dietrich

Grigory Vazhenin

Christian Schwarz

Willi Rohland

Recep Kocer

Frank Von-Horsten

The present invention relates to a composition comprising one or a mixture of two or more quinoline-polyethylene glycol containing compound, each quinoline-polyethylene glycol containing compound comprising:

Acidic aqueous composition for electrolytic copper plating

The invention relates to an acidic aqueous composition for electrolytic copper plating, the composition comprising

Acidic aqueous composition for electrolytically depositing a copper deposit

The present invention relates to an acidic aqueous composition (plating bath) for electrolytic copper plating (electrolytic deposition of copper), the composition comprising 

The invention relates to a device and method for producing targeted flow and current density patterns in a chemical and/or electrolytic surface treatment. The device comprises a flow distributor body which is disposed, with the front face thereof, plane-parallel to a substrate to be processed, and which has outlet openings on the front face, through which process solution flows onto the substrate surface. The process solution flowing back from the substrate is led off through connecting passages onto the rear face of the flow distributor body. At the same time a targeted distribution of an electrical field on a conductive substrate surface is effected by a specific arrangement of said connecting passages.

Device and method for producing targeted flow and current density patterns in a chemical and/or electrolytic surface treatment

Growing community of inventors

Berlin, Germany

Ralf Schmidt