Applied Materials, Inc.

Rajesh Kumar Putti

Ananthkrishna Jupudi

Prashant Agarwal

Vinodh Ramachandran

Lean Wui Koh

Methods and apparatus for processing a substrate. For example, a processing chamber can include a power source, an amplifier connected to the power source, comprising at least one of a gallium nitride (GaN) transistor or a gallium arsenide (GaAs) transistor, and configured to amplify a power level of an input signal received from the power source to heat a substrate in a process volume, and a cooling plate configured to receive a coolant to cool the amplifier during operation.

Solid-state power amplifiers with cooling capabilities

Microwave transmission window assembly

Apparatus for transmitting microwaves into a process chamber using a microwave pressure window assembly. The microwave pressure window assembly may include a first plate with a first aperture surrounded by a first recess for a first pressure seal, a second plate with a second aperture surrounded by a second recess for a second pressure seal, a dielectric plate configured to transmit microwaves and interposed between the first plate and the second plate and between the first pressure seal and the second pressure seal. The apertures include a first vertical step area on a first vertical side of the apertures and a second vertical step area on a second vertical side of the apertures opposite of the first vertical side. The first vertical step areas and the second vertical step areas may have a thickness of approximately 50% of a thickness of the plates that includes a dielectric plate recess.

Microwave window including first and second plates with vertical stepped areas configured for pressure sealing a dielectric plate between the first and second plates

Growing community of inventors

Singapore, Singapore

Rajesh Kumar Putti