Tokyo Electron Limited

Rajendrapura Seetharamaiya Krishnaswamy

Tugrul Yasar

Israel Wagner

Ira Reiss

Subhadra Gupta

Method and apparatus for forming the longitudinal edges of stacks of razor blades by conveying the stacks of razor blades along a conveying path in a vacuum chamber past material deposition and material etching stations. The material etching stations are mounted in the sides of the vacuum chamber to be directed generally toward the edge sides of the edges of the razor blades. In another embodiment, stacks of razor blades are mounted on opposite sides of a rotating pallet and material deposition and etching stations are mounted in both side walls of the vacuum chamber. A DC or RF bias is applied to the stacks of razor blades by capacitively coupling the RF bias or conducting by electrical contacts a DC or RF bias to a central portion of the rotating pallet.

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Spring Valley, NY, United States of America

Rajendrapura Seetharamaiya Krishnaswamy