U.S. Philips Corporation

Rainer Veyhl

Rudolf Thyen

Claus-Peter Klages

Heinz Dimigen

Klaus Taube

Hubertus Hubsch

Eckart Boettger

Henning Bonebeta

A resistive film includes carbon (40-95 at. %), one or more metal(s) (4-60 at.%) and hydrogen (1-30 at. %). The film has a resistivity in excess of 1000 .mu..OMEGA.cm and a temperature coefficient TC in the range of between -100 and +100 ppm/K.

Resistive film

A resistive component which is composed of one or more resistive films which, if necessary, may be provided on a substrate, and at least one of which is on the basis of CrSi, the resistive film on the basis of CrSi comprising 5-50 at. % Cr, 10-70 at. % Si, 5-50 at. % O and at least one element of the group formed by B, C and N in a concentration of 1-50 at. %. The advantageous properties of the resistive component in accordance with the invention are based on the reactive incorporation of oxygen and carbon or oxygen and nitogen or oxygen and carbon and nitrogen into resistive films on the basis of CrSi.

Resistive component comprising a CRSI resistive film

The invention relates to a resistive film comprising carbon (40-95 at. %), one or more metal(s) (4-60 at. %) and hydrogen (1-30 at. %), said film having a resistivity in excess of 1000.mu..OMEGA.cm and a temperature coefficient TC in the range between -100 and +100 ppm/K.

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Heide, Germany

Rainer Veyhl