Suss Microtec Lithography Gmbh

Rainer Targus

Thomas Grund

Ralph Beyer

A holding apparatus, in particular a chuck, for a substrate comprises a main body with a upper side, a carrier element arranged in a recess of the main body so as to be vertically movable such that it can be adjusted between a protruding loading position and a retracted clamping position, the carrier element comprising a support surface for placement of the substrate. The support surface has a smaller diameter than the main body. A lifting element lifts the carrier element to the loading position. The carrier element seals the recess such that a sealed cavity is provided between the main body and the carrier element, which cavity can have a negative pressure applied thereto which counteracts the effect of the lifting element.

Holding apparatus and method for holding a substrate

By means of the device for coating a substrate () according to the present invention, a homogeneous coating of the substrate () can be achieved. The device comprises a holding and rotating means for holding and rotating the substrate () about an axis (A). A disk () is provided below the substrate (). Said disk () is arranged coaxially with respect to the substrate (), has at least the same diameter as the substrate () and is able to rotate synchronously with the substrate (). By means of the disk (), air swirls at the edge of and below the substrate () are avoided during coating of the substrate (). Thus, it is possible to obtain a homogeneous coating. For being able to load and unload a substrate () into and out of the device by means of a conventional gripper system (), the distance between substrate () and disk () is increased during loading and unloading.

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Garching, Germany

Rainer Targus