Heraeus Quarzglas Gmbh & Co Kg

Shin-etsu Quartz Products Co., Ltd.

Rainer Koeppler

Waltraud Werdecker

Bodo Kuehn

Walter Lehmann

Wolfgang Englisch

Johann Leist

Hiroshi Matsui

Bruno Uebbing

Ralf Takke

Udo Gertig

Ulrich Kirst

Fritz-Ulrich Kreis

Klaus Arnold

Tsukasa Sakaguchi

Kasumi Hoshikawa

The present invention relates to a quartz glass blank for an optical component for transmitting radiation of a wavelength of 15 nm and shorter, the blank consisting of highly pure quartz glass, doped with titanium and/or fluorine, which is distinguished by an extremely high homogeneity. The homogeneity relates to the following features: Said quartz glass blank can only be obtained in that a doped quartz glass obtained by flame hydrolysis of a compound containing silicon, titanium and/or fluorine is formed as a large volume rod-shaped starting body into a homogeneous quartz glass blank using several forming steps and is homogenized.

Quartz glass blank and method for producing said blank

The invention relates to a method for the economic production of a blank for a component made from laser-active quartz glass in any form or dimension. The method comprises the following method steps: a) preparation of a dispersion with a solids content of at least 40 wt. %, comprising SiOnanopowder and doping agents, including a cation of the rare earth metals and transition metals in a fluid, b) granulation by agitation of the dispersion, with removal of moisture to form a doped SiOgranulate of spherical porous granular particles with a moisture content of less than 35 wt. % and a density of at least 0.95 g/cm, c) drying and purification of the SiOgranulate, by heating to a temperature of at least 1000&#xb0; C. to form doped porous SiOgrains with an OH content of less than 10 ppm and d) sintering or fusing the doped SiOgrains in a reducing atmosphere to give the blank made from doped quartz glass.

Method for the production of laser-active quartz glass and use thereof

The granule consists of individual granules approximately spherical in shape, having a pore volume of 0.5 cm, a mean diameter of pores of 50 nm or less, a specific surface area of 100 m/g or less, and a bulk density of 0.7 g/cmor higher. It is produced by dispersing a fumed silica obtained by hydrolysis of a silicon compound into pure water to obtain a slurry, and drying the slurry. The granule is used for producing high purity synthetic quartz glass powder. The method further comprises: a first heat treatment under an oxygen-containing atmosphere, a second heat treatment in a temperature range of from 600 to 1100&#xb0; C., and a third heat treatment in a temperature range of from 1100 to 1300&#xb0; C. under an atmosphere containing hydrogen chloride; and a step of densification comprising calcining the product at a temperature not higher than 1500&#xb0; C. under vacuum or in an atmosphere of gaseous hydrogen or gaseous helium. To calcine the powder without causing fusion adhesion of the particles, bubbling fluidization of said porous silica granule is conducted by supplying gaseous helium and calcining thereof in a temperature range of from 1000 to 1600&#xb0; C.

Porous silica granule, method for producing the same, and method for producing synthetic quartz glass powder using the porous silica granule

Composite material with high resistance to temperature changes and a high density, and having an SiO -containing matrix with quartz glass grains embedded therein is produced by preparing a suspension from a particle mixture of finely divided SiO powder having at least two different particle fractions and of the quartz glass grains, forming a green compact and sintering the compact. The matrix has an SiO content of at least 99% by wt. and is formed from at least first and second particle fractions, each of which is present as granules of nanoscale, amorphous, synthetically produced SiO primary particles having a mean primary particle size of less than 100 nm. The composite material has an SiO -containing matrix with an SiO content of at least 99% by wt. It is particularly suited for applications such as starting material for producing a permanent mold for melting solar silicon.

Method of producing a composite material having a high SiO2 content, composite material obtained according to the method, and permanent mold made thereof

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Seligenstadt, Germany

Rainer Koeppler