Carl Zeiss Microscopy Gmbh

Rainer Arnold

Michael Albiez

Hubert Mantz

Josef Biberger

Ralph Pulwey

Jaroslaw Paluszynski

Andreas Adolf

Harald Niebel

Matthias Langer

Marcin Janaszewski

Markus Esseling

Klaus Hegele

Ernst Draszba

A particle microscope includes a particle beam system directing a particle beam onto a sample. The particle beam system includes a magnetic lens energized by an adjustable lens current. The sample is positioned at an adjustable distance from the lens, and particles of the beam have an adjustable kinetic energy. A method of operating such microscope includes positioning a sample at a distance from the lens, adjusting the kinetic energy, changing the lens current at plural different lens current change rates, determining a lens current at focus for each of the plural different lens current change rates, and determining an optimized lens current based on the determined lens currents at focus and the lens current change rates.

Methods of operating particle microscopes and particle microscopes

A method includes capturing a first image of the sample via a detector, wherein the particles of the primary particle beam have a first average energy so that the interaction products detected by the detector predominantly contain sample information from a sample layer lying below the sample surface. The method also includes removing the outermost sample layer with the aid of the cutting device, and capturing a second image of the sample via the detector, wherein the particles of the primary particle beam have a second average energy so that the interaction products detected by the detector predominantly contain sample information from the surface layer of the sample. The method further includes calculating the lateral shift/lateral offset of the sample from a comparison of the first and second images, and compensating for the lateral offset.

Method for avoiding artefacts during serial block face imaging

A method for producing a representation of an object using a particle beam, as well as a particle beam device for carrying out the method are disclosed. The system described herein is based on the object of specifying the method and the particle beam device for producing a representation of an object such that images which are produced, in particular including FFT images, are as free as possible of artifacts which are not caused by the object to be examined. This is achieved in particular in that pixel lives, line flyback times and pixel pause times are varied in raster patterns.

Method for producing a representation of an object by means of a particle beam, as well as a particle beam device for carrying out the method

Particle beam systems and methods

A particle beam system comprises a particle beam sourcefor generating a primary particle beam, an objective lensfor focusing the primary particle beamin an object plane; a particle detector; and an X-ray detectorarranged between the objective lens and the object plane. The X-ray detector comprises plural semiconductor detectors, each having a detection surfaceoriented towards the object plane. A membrane is disposed between the object plane and the detection surface of the semiconductor detector, wherein different semiconductor detectors have different membranes located in front, the different membranes differing with respect to a secondary electron transmittance.

Particle beam system

Growing community of inventors

Ulm, Germany

Rainer Arnold