Bck Networks, Inc.

Synopsys, Inc.

Raghava Kondepudy

Saibal Banerjee

Gano Broto Chatterji

Gerard Luk-Pat

Gerard T Luc-Pat

A source-address independent, multi-path routing method for use in a communication network is disclosed. A network node uses an information packet's destination address to determine a plurality of neighbors it has a proportional likelihood to forward that packet to, such that packets can be sent over multiple paths to a destination node without undesirable looping. Multiple-neighbor proportional forwarding routing tables are determined by computing a directed graph of multiple optimal paths to each destination node. Optimal paths and forwarding proportions are based on link capacities. The multi-path routing method provides maximized throughput, reduced congestion and superior load balancing over single-path routing. Source-address independence also overcomes a major problem of more traditional source-address dependent multi-path routing methods. The source-address independent, multi-path routing method can be implemented in mixed networks where some nodes do not implement the method. Data structures and methods for determining the optimal paths and parameters are provided.

Stream basis set division multiplexing

Multi-neighbor proportional forwarding in a network

Routing table for non-uniform random neighbor selection

To provide fast mask defect scoring, approximated wafer simulations (e.g. using one convolution) are performed on the defect inspection image and its corresponding reference inspection image. Using the approximated defect wafer image and the approximated reference wafer image generated by these approximated wafer simulations, a defect maximum intensity difference (MID) is computed by subtracting one approximated wafer image from the other approximated wafer image to generate a difference image. After a defect region of the difference image is clearly defined, a simulation at the centroid (i.e. a single point) of the defect region is performed. After the defect MID is computed (represented by an intensity) it can be compared to a prototype MID, which can represent a generic nuisance defect.

Approximating wafer intensity change to provide fast mask defect scoring

Growing community of inventors

San Jose, CA, United States of America

Raghava Kondepudy