Samsung Electronics Co., Ltd.

Rae-won Yi

Jin Hyeock Choi

Dong-gun Lee

Heung-suk Oh

Sin-jeung Park

Byung-Gook Kim

Su-Young Lee

Byoung-Sup Ahn

Ji-hoon Na

A method of inspecting a surface includes loading an inspection object on a stage of a multibeam inspection device configured to generate a beam array, and scanning a plurality of inspection areas of the inspection object at a same time with the beam array, wherein one of the first inspection areas is smaller than an area formed by a quadrangle connecting respective centers of corresponding four adjacent beams of the beam array, and an adjacent area of the one first inspection area is not scanned with the beam array.

Method of inspecting surface and method of inspecting photomask using the same

An exposure apparatus comprising, a stage configured to receive a substrate, a mark array disposed on the stage and comprising a first mark and a second mark separated from each other by a first distance, a first beam irradiator configured to irradiate a first beam to the first mark, a second beam irradiator being separated from the first beam by a pitch greater than the first distance and configured to irradiate a second beam to the second mark, a detector disposed over the mark array and configured to receive a third beam reflected by the first mark and a fourth beam reflected by the second mark, and a controller configured to control the position of the stage using an output of the detector.

Exposure apparatus and method of manufacturing semiconductor device

A method of providing a photolithography pattern can be provided by identifying at least one weak feature from among a plurality of features included in a photolithography pattern based on a feature parameter that is compared to a predetermined identification threshold value for the feature parameter. A first region of the weak feature can be classified as a first dosage region and a second region of the weak feature can be classified as a second dosage region. Related methods and apparatus are also disclosed.

Photolithography patterning system using feature parameters

Methods of providing photolithography patterns using feature parameters

Growing community of inventors

Suwon-si, South Korea

Rae-won Yi