Government of the United States of America, As Represented by the Secretary of Commerce

R N Ghoshtagore

Jeffry Joseph Sniegowski

Richard A Allen

Michael W Cresswell

Loren W Linholm

Michael Gaitan

William B Penzes

An improved test structure for measurement of width of conductive lines formed on substrates as performed in semiconductor fabrication, and an improved reference grid for calibrating instruments for such measurements, is formed from a monocrystalline starting material, having an insulative layer formed beneath its surface by ion implantation or the equivalent, leaving a monocrystalline layer on the surface. The monocrystalline surface layer is then processed by preferential etching to accurately define components of the test structure. The substrate can be removed from the rear side of the insulative layer to form a transparent window, such that the test structure can be inspected by transmissive-optical techniques. Measurements made using electrical and optical techniques can be correlated with other measurements, including measurements made using scanning probe microscopy. Nested quadrilateral calibration reference grids particularly useful in calibrating optical coordinate measurement instruments are disclosed.

Monocrystalline test and reference structures, and use for calibrating

An improved test structure for measurement of width of conductive lines formed on substrates as performed in semiconductor fabrication, and for calibrating instruments for such measurements, is formed from a monocrystalline starting material, having an insulative layer formed beneath its surface by ion implantation or the equivalent, leaving a monocrystalline layer on the surface. The monocrystalline surface layer is then processed by preferential etching to accurately define components of the test structure. The substrate can be removed from the rear side of the insulative layer to form a transparent window, such that the test structure can be inspected by transmissive-optical techniques. Measurements made using electrical and optical techniques can be correlated with other measurements, including measurements made using scanning probe microscopy.

Monocrystalline test structures, and use for calibrating instruments

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Ellicott City, MD, United States of America

R N Ghoshtagore