Applied Materials, Inc.

Qun Jing

Ludovic Godet

Mingwei Zhu

Yue Chen

Jinxin Fu

David Masayuki Ishikawa

Takashi Kuratomi

Zihao Yang

Yongmei Chen

Jinyu Lu

Jingyi Yang

A method of processing an optical device is provided, including: positioning an optical device on a substrate support in an interior volume of a process chamber, the optical device including an optical device substrate and a plurality of optical device structures formed over the optical device substrate, each optical device structure including a bulk region formed of silicon carbide and one or more surface regions formed of silicon oxycarbide. The method further includes providing one or more process gases to the interior volume of the process chamber, and generating a plasma of the one or more process gases in the interior volume for a first time period when the optical device is on the substrate support, and stopping the plasma after the first time period. A carbon content of the one or more surface regions of each optical device structure is reduced by at least 50% by the plasma.

Optical device improvement

Growing community of inventors

Santa Clara, CA, United States of America

Qun Jing