City University of Hong Kong

Quanfeng He

Yong Yang

Zhaoyi Ding

Jian Lu

Yang Yang Li

Tianyu Wang

Zebiao Li

Haidong Bian

A method for preparing a high entropy alloy (HEA) structure includes the steps of: preparing an alloy by arc melting raw materials comprising five or more elements; drop casting the melted alloy into a cooled mold to form a bulk alloy; applying an external force against the bulk alloy to reshape the bulk alloy; and heat-treating the reshaped bulk alloy, wherein the bulk alloy is reshaped and/or heat-treated for manipulating the distribution of the microstructure therein. The present invention also relates to a high entropy alloy structure prepared by the method.

High entropy alloy structure and a method of preparing the same

A method for preparing an entropy-stabilized ceramic thin film coating includes preparing a first layer formed by raw materials with a plurality of metal elements, and subjecting the first layer to reaction with anion thereby transforming at least a portion of the first layer to a second layer. The present invention also discloses an entropy-stabilized ceramic thin film coating and a component coated with an entropy-stabilized ceramic thin film coating.

Entropy-stabilized ceramic thin film coating, method for preparing the same, and component coated with the same

A method for preparing a high entropy alloy (HEA) structure includes the steps of: preparing an alloy by arc melting raw materials comprising five or more elements; drop casting the melted alloy into a cooled mold to form a bulk alloy with eutectic microstructure therein; and subjecting the bulk alloy to an acidic condition to form a bulk porous structure with eutectic microstructure therein. A high entropy alloy structure is also provided as prepared by the method.

A new technique, referred to as PSBEE, is disclosed and enables fabrication of freestanding nanomembranes. The PSBEE technique enables fabrication and synthesis of nanomembranes comprising 2D high entropy alloys and 2D metallic glasses and may be extended to ceramics and semiconductors, thereby enabling the fabrication of large-scale freestanding nanomembranes across a wide range of materials, including those deemed to have a great potential for future functional and structural use. To form nanomembranes using PSBEE, a plurality of membranes may be prepared and subjected to thermoplastic compression. Afterwards, one of the membranes may be removed and the remaining membranes may undergo additional thermoplastic compression in the presence of a Si substrate. Once a threshold level of smoothness is achieved, a coating or film may be applied and then separated from the final plate.

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Hong Kong, China

Quanfeng He