Boe Technology Group Co., Ltd.

Hefei Boe Optoelectronics Technology Co., Ltd.

Beijing Boe Optoelectronics Technology Co., Ltd.

Qiyu Shen

Na Zhao

Xufei Xu

Xu Chen

Jian Nan Guo

Jie Song

Yijun Wang

Gaofei Shi

Honggang Gu

Zhaofan Liu

Chuanyan Wang

Gangqi Huang

A touch substrate, a method of driving the same, and a touch display device are provided, and the touch substrate includes: a plurality of emitting electrode patterns arranged along a first direction, wherein the emitting electrode patterns includes an emitting electrode sub-pattern or a plurality of electrically connected emitting electrode sub-patterns; a plurality of first receiving electrode patterns arranged along a Y-direction, wherein the first receiving electrode patterns includes a plurality of electrically connected first receiving electrode sub-patterns; a plurality of second receiving electrode patterns arranged along an X-direction and insulated from the first receiving electrode pattern, and the second receiving electrode pattern includes a plurality of second receiving electrode sub-patterns electrically connected in sequence; the first direction intersecting both the X-direction and the Y-direction.

Touch substrate, method of driving the same and touch display device

Embodiments of the present invention provide a display substrate, a fabricating method thereof, and a display panel. The display substrate includes a substrate, a display structure layer disposed on the substrate, and an alignment layer. A grating polarizing layer is disposed in the display structure layer, and an optical alignment direction of the alignment layer is parallel to or perpendicular to a transmission axis direction of the grating polarizing layer.

Display substrate and fabricating method thereof, and display panel

There is provided a manufacture method of an array substrate of a display device using TFT as a pixel control unit, an array substrate, and a display apparatus. In this method, when a data line and source and drain electrodes of a TFT are prepared, a half-tone mask is used to retain at least one part of a photoresist on the data line; and the retained photoresist is softened by heating so that the at least one part of the data line is coated by the retained photoresist.

Production method of an array substrate of a display device using TFT as a pixel control unit

The present disclosure provides a method for manufacturing a thermal insulation film, a thermal insulation structure, and a display device. The method for manufacturing the thermal insulation film includes: providing a substrate; forming a sacrificial layer on the substrate; forming a thermal insulation layer on the sacrificial layer, the thermal insulation layer including at least one opening capable of exposing a portion of the sacrificial layer; and etching the sacrificial layer through the opening, so as to form a plurality of hollow holes between the thermal insulation layer and the substrate. A method for manufacturing the thermal insulation film according to the present disclosure is used for manufacturing a thermal insulation film.

Method for manufacturing thermal insulation film, thermal insulation structure, and display device

The present invention discloses an array substrate and a manufacturing method thereof, and a liquid crystal display device, which relate to the field of liquid crystal display technology and may keep patterns at the slit tail ends of slit electrodes consistent with predesigned patterns so as to avoid a trace mura phenomenon. The array substrate includes a plurality of sub-pixel units defined by crossing of a plurality of gate lines and a plurality of data lines, wherein a first electrode is arranged in each sub-pixel unit, the first electrode is a slit electrode, and a common electrode line is arranged below the first electrode. In each sub-pixel unit, a light blocking layer is arranged between the common electrode line and the first electrode, and both the slit tail end of the first electrode and the common electrode line are positioned in the area of the light blocking layer.

Array substrate and manufacturing method thereof, and liquid crystal display device

The present disclosure provides a touch display substrate and a touch display device, relates to a display field and solves a technical problem of lower sensibility of the touch display device. The touch display substrate comprises a plurality of touch electrodes, wherein the plurality of touch electrodes are divided into at least one touch electrode pair; each of the touch electrode pair includes first and second touch electrodes which are adjacent to each other; the first touch electrode comprises a first bending portion; the second touch electrode comprises second bending portion; and the second bending portions correspond to the first bending portions at positions. The touch display substrate according to the present disclosure may be applied to the touch display device.

Touch display substrate and touch display device

A rubber frame, a backlight, a display device and assembling method thereof are disclosed. Embodiments of the present disclosure relate to the field of display technology, can prevent the liquid crystal panel and the backlight from being loosen or separated from each other and can eliminate or at least reduce display faults caused thereby. The rubber frame of the disclosure is suitable for liquid crystal display devices, and a side wall of the rubber frame is provided a slot for receiving a liquid crystal cell. The slot is formed as a half-closed structure having three enclosing side walls and only one open side. The rubber frame and the display device of the present disclosure include the rubber frame.

Rubber frame, backlight, display device and assembling method thereof

The present invention provides a manufacturing method of an array substrate, an array substrate and a display apparatus. The manufacturing method comprises steps of: forming a thin film transistor and a signal line on a glass substrate, and forming an organic insulating layer above the thin film transistor and the signal line correspondingly; forming a passivation insulating layer on the organic insulating layer, wherein, before forming the passivation insulating layer, the manufacturing method further comprises a step of: performing a pre-heating process on the glass substrate on which the organic insulating layer is formed.

Manufacturing method of array substrate, array substrate and display apparatus

A backlight module and a display apparatus are provided. The backlight module comprises a backlight source and optical sheets, wherein the backlight source is an organic electroluminescent device, the optical sheets are directly adhered to a light emitting side of the organic electroluminescent device facing a display panel. The light emitted by the organic electroluminescent device is directed emitted after passing through the optical sheets. The display apparatus comprises such a backlight module. A thickness of such backlight module can be efficiently reduced.

Backlight module and display apparatus

A method of manufacturing a thin film transistor is disclosed. The method of manufacturing the thin film transistor includes: manufacturing a substrate; forming an oxide semiconductor layer on the substrate; forming a pattern including an active layer through a patterning process; forming a source and drain metal layer on the active layer; and forming a pattern including a source electrode and a drain electrode through a patterning process, an opening being formed between the source electrode and the drain electrode at a position corresponding to a region of the active layer used as a channel, wherein the step of forming the pattern including the source electrode and the drain electrode through a patterning process includes: removing a portion of the source and drain metal layer corresponding to the position of the opening through dry etching. The method may also be used to manufacturing a thin film transistor.

Methods of manufacturing thin film transistor and array substrate

Embodiments of the present application provide a method for producing an array substrate. The array substrate includes a planarization layer provided on a layer of thin film transistors and a first electrode provided on the planarization layer for a light emitting device. The method includes the steps of: forming a pixel definition layer for placing the first electrode, a via hole for the first electrode and a spacer on the planarization layer by a single patterning process with a single mask. The array substrate is produced by the method provided by the present embodiment, so that the number of the used patterning processes and the number of the used masks are reduced.

Method for producing array substrate and array substrate

An array substrate, a manufacturing method thereof and a display device are provided; in the array substrate, two adjacent rows of the pixel units () are taken as a group of pixel unit rows; in each group of the pixel unit rows, since the pixel electrodes in two adjacent pixel units () of a same column are all electrically connected with one composite transistor (), and the composite transistor () can be turned on or off under the control of different levels of control voltages, to charge the pixel electrodes in two adjacent pixel units () of the same column at different times, each group of the pixel unit row can share a gate line located between the two rows of the pixel units, as compared with the conventional array substrate, the number of the gate lines disposed on the array substrate is reduced by half, so that the aperture ratio of the array substrate can be improved, and the brightness of the display panel can be further improved.

Array substrate, manufacturing method thereof and display device

An array substrate includes a base substrate () and a gate line () and a data line () provided on the base, the gate line () and the data line () define a pixel unit, and in the pixel unit, a thin film transistor () is provided, the thin film transistor () includes a gate electrode (), a gate insulation layer (), an active layer (), a source electrode () and a drain electrode (). The gate insulation layer () includes a first gate insulation portion () and a second gate insulation portion (), the gate electrode () is located between the first gate insulation portion () and the second gate insulation portion (), and the second gate insulation portion () is located between the gate electrode () and the active layer (). The array substrate further includes a conductive pad (), and a first via () corresponding to the conductive pad () is provided in the gate insulation layer () at both sides of the gate line (), and the data line () is connected to the conductive pad () through the first via (). The array substrate is capable of improving the definition, the resolution and the aperture ratio of a display device. A manufacturing method for an array substrate and a display device including such an array substrate are also disclosed.

Display device having data line connected to conductive pad through first via and its manufacturing method

The present invention provides a TFT and a manufacturing method thereof, an array substrate and a display device. The TFT comprises a gate, an active layer located on the gate, an ohmic contact layer located on the active layer, and a first electrode and a second electrode located on the ohmic contact layer, wherein the first electrode and the second electrode are partially overlapped with the active layer, the ohmic contact layer is located within a region where the first electrode and the second electrode are overlapped with the active layer; the active layer is partially overlapped with the gate, the active layer comprises at least one opening region partially overlapped with the gate; and the first electrode and/or the second electrode extends beyond the active layer through the at least one opening region.

TFT and manufacturing method thereof, array substrate

A method for manufacturing an array substrate comprising: using a mask plate (), and controlling exposure energy to obtain a first exposure feature size, so as to form a gate metal layer on the array substrate; and using the mask plate again, and controlling exposure energy to obtain a second exposure feature size larger than a size of the gate metal layer, so as to form low doped regions () located at opposite sides of the gate metal layer and having a same length. The method can form the two low doped regions of the LTPS-TFT having the same length and guarantee the ability of the LTPS-TFT to suppress the leakage current.

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Beijing, China

Qiyu Shen