Asml Netherlands B.v.

Qiushi Zhu

Igor Vladimirovich Fomenkov

Alexander Igorevich Ershov

Martinus Hendrikus Antonius Leenders

Johannes Hubertus Josephina Moors

Johannes Henricus Wilhelmus Jacobs

Jan Steven Christiaan Westerlaken

Fei Liu

Antonius Theodorus Wilhelmus Kempen

Andrew David LaForge

Yue Ma

William Peter Van Drent

Klaus Martin Hummler

Alexey Sergeevich Kuznetsov

Peter Gerardus Jonkers

Hendrikus Alphonsus Ludovicus Van Dijck

Hubertus Johannes Van De Wiel

Parham Yaghoobi

Jeroen Hubert Rommers

Rui Miguel Duarte Rodrigues Nunes

Fernando Brizuela

Rob Carlo Wieggers

Umesh Prasad Gomes

Elena Nedanovska

Celal Korkmaz

Alexander Downn Kim

Degradation of the reflectivity of one or more reflective optical elements in a system for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.

Prolonging optical element lifetime in an EUV lithography system

Degradation of the reflectivity of one or more reflective optical elements in a system (SO) for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber () containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.

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Qiushi Zhu