Hitachi Global Storage Technologies Netherlands B.v.

Qin Pan

Robert Waltman

Paul Marion Green

Garth Wade Helf

Eric Christian O'Brien

Alan P Giorgi

Anthony L Smith

A method is presented for controlling process delay times between a) thin film deposition and lubricant application, and b) lubricant application and abrasive polishing. Applicants have discovered that for certain lubricants, a minimum delay time after the overcoat has been deposited before the lubricant is applied increases the number of disks passing the glide test after abrasive polishing. In addition, applicants have discovered that for certain lubricants, the abrasive polishing should take place within a maximum time window following the application of the lubricant. A computerized work-in-progress tracking system is preferably used to implement the method of the invention.

Growing community of inventors

Cupertino, CA, United States of America

Qin Pan