Micron Technology Incorporated

Qianlan Liu

Gordon A Haller

Amitava Majumdar

Shawn D Lyonsmith

Pradeep Ramachandran

Steve K McCandless

Ted Lyle Taylor

Ahmed Nayaz Noemaun

Lisa R Copenspire-Ross

Amber Huddleston

Charlotte Singleton

Amber Thompson

A method of predicting virtual metrology data for a wafer lot that includes receiving first image data from an imager system, the first image data relating to at least one first wafer lot, receiving measured metrology data from metrology equipment relating to the at least one first wafer lot, applying one or more machine learning techniques to the first image data and the measured metrology data to generate at least one predictive model for predicting at least one of virtual metrology data or virtual cell metrics data of wafer lots, and utilizing the at least one generated predictive model to generate at least one of first virtual metrology data or first virtual cell metrics data for the first wafer lot.

System for predicting properties of structures, imager system, and related methods

Apparatuses, machine-readable media, and methods related to cleaning detection are described. A cleaning detection system can be used to determine whether there is a need for cleaning by comparing detection inputs, from sensors of the cleaning detection system, that are associated with an updated status of an area to a baseline status of an area. The cleaning detection system can receive a number of initial inputs associated with an area scanned by the device, determine a baseline status of the area based on the number of initial inputs, receive a number of detection inputs associated with the area scanned by the device, and determine whether a location of the area is in need of cleaning based on a comparison of the baseline status and the number of detection inputs.

Cleaning detection system

Growing community of inventors

Boise, ID, United States of America

Qianlan Liu