Wuxi Unicomp Technology Co., Ltd.

Qi Hou

Wei Zhang

Liucheng Wang

Xiaojun Qiu

Wenwen Kong

An open microfocus X-ray source and a control method thereof are provided. The open microfocus X-ray source includes: an open X-ray tube, a high voltage power supply (HVPS) system, a vacuum system and a control system. The open X-ray tube includes a cathode system, a deflection system and a focusing system. The HVPS system is configured to provide an emission current I, an accelerating high voltage Uand a grid voltage Ufor an electron beam. The vacuum system is configured to perform vacuumization. The control system is configured to control, according to a spot size of an electron beam for bombarding an anode target, the HVPS system to adjust the emission current I, the accelerating high voltage U, a deflection coil current Iof the deflection system, and a focusing coil current Iof the focusing system, such that the spot size meets a preset requirement.

Growing community of inventors

Wuxi, China

Qi Hou