Shanghai Micro Electronics Equipment (Group) Co., Ltd.

Shanghai Huali Integrated Circuit Corporation

Qi Cheng

Feibiao Chen

Jinli Yang

Tao Liu

Qiwei Wang

Chang Jin Zhou

Yuefei Chen

Jingchao Qi

Zhenxing Yang

Xuting Wu

Haihua Zou

Lei Diao

The present application discloses an integrated structure of MOS transistors having different working voltages. A second spacer of a second MOS transistor having a middle second working voltage is formed by adding a third sub-spacer on the basis of a first spacer of a first MOS transistor having a relatively low first working voltage, and the first spacer is formed by stacking a first sub-spacer and a second sub-spacer. The thickness of the second spacer is adjusted via the third sub-spacer, so as to ensure that a GIDL leakage of the second MOS transistor under the second working voltage satisfies a requirement. The present application also discloses a method for manufacturing an integrated structure of MOS transistors having different working voltages.

Integrated structure of MOS transistors having different working voltages and method for manufacturing same

Bottle

Dispensing stopper

A measurement device and method for focusing and leveling are disclosed. The device includes a measuring optical path and a first monitoring optical path. Measuring light in the measuring optical path interacts with a wafer and is then incident on a measuring detector to form thereon a measuring mark. First monitoring light in the first monitoring optical path is incident on a measuring detector to form thereon a first monitoring mark. An error in a measurement result of the wafer that arises from a drift of the measuring detector can be eliminated by compensating for a vertical deviation of the wafer obtained by subtracting a drift of the first monitoring mark from a displacement of the measuring mark. In this way, measurement accuracy and stability can be improved by monitoring and correcting the drift of the measuring detector.

Focusing and leveling measurement device and method

In an exposure apparatus and a method for defocus and tilt error compensation, each of alignment sensors () corresponds to and has the same coordinate in the first direction as a respective one of focusing sensors (), so that each of the alignment sensors () is arranged on the same straight line as a respective one of the focusing sensors (). As such, alignment marks can be characterized with both focusing information and alignment information. This enables the correction of errors in the alignment information and thus achieves defocus and tilt error compensation, resulting in significant improvements in alignment accuracy and the production yield.

Exposure device and out-of-focus and tilt error compensation method

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Shanghai, China

Qi Cheng