Samsung Electronics Co., Ltd.

Pyung Moon

Sun-Young Lee

Ki-chul Kim

Jae Hee Lee

Bongjin Kuh

Sukjin Chung

Ki Chul Kim

Sung-ho Kang

Soonwook Jung

Yong Hun Lee

Yong-hun Lee

Sung Ho Kang

Junyeong Lee

Un Ki Kim

Je Hoon Oh

Yong Seok Song

Un-ki Kim

Hang Mook Park

Disclosed are method and apparatus for forming a thin layer. The method for forming the thin layer comprises providing a substrate including patterns, forming a bonding layer on the substrate covering an inner surface of a gap between the patterns, forming a preliminary layer on the bonding layer filling the gap; and thermally treating the preliminary layer to form the thin layer. The bonding layer is a self-assembled monomer layer formed using an organosilane monomer. The preliminary layer is formed from a flowable composition comprising polysilane.

Method and apparatus for forming a thin layer

A plasma monitoring device includes a fixing unit, a plasma measuring unit disposed to be in contact with the fixing unit, and measuring a luminous intensity of emitted light of a plasma to output a luminous intensity measurement value, a reference light source unit irradiating reference light having a uniform luminous intensity to the plasma measuring unit, and a control unit receiving the luminous intensity measurement value to calculate a luminous intensity value of the emitted light, controlling a voltage applied to the reference light source unit to uniformly control a luminous intensity of the reference light, comparing a luminous intensity of the reference light irradiated to the plasma measuring unit with a previously stored luminous intensity reference value to detect a correction factor, and applying the correction factor to a luminous intensity value of the emitted light to correct the luminous intensity measurement value.

Plasma monitoring device

A method of performing a surface treatment includes passivating a surface of an insulating part in a reaction chamber, and then performing a hydrogen plasma annealing treatment on a substrate in the reaction chamber. The passivation of the surface of the insulating part includes supplying a nitrogen-based gas into the reaction chamber and exciting the nitrogen-based gas in the reaction chamber using a plasma generator.

Method for preparing hydrogen plasma annealing treatment, method for performing hydrogen plasma annealing treatment, and apparatus therefor

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Seoul, South Korea

Pyung Moon