Samsung Electronics Co., Ltd.

Protopopov Vladimir

Sung Ho Jang

Ki Ho Hwang

Doug Yong Sung

Se Jin Oh

Yun Kwang Jeon

Kul Inn

Sang Heon Lee

Vladimir Volynets

Young Do Kim

Yuri Barsukov

An apparatus for monitoring an interior of a process chamber including a process chamber including a chamber body and a view port defined in the chamber body, a cover section including a pinhole in one end, the cover section disposed to correspond to an end portion of the view port, the cover section having a first length in a direction toward a center point of the process chamber, and a sensing unit inserted into the view port to monitor the interior of the process chamber through the pinhole, a region in the process chamber to be sensed by the sensing unit determined based on the first length may be provided.

Apparatus for monitoring process chamber

A pulsed plasma analyzer includes a pulse modulator that controls an off-time of a pulsed plasma that includes a target radical, an optical spectrometer that measures optical emissions of the pulsed plasma after the off-time to determine optical emission data, and a concentration estimating module that estimates a concentration of the target radical during the off-time based on an initial optical emission value of the optical emission data that changes as a function of the off-time, and outputs an estimated concentration.

Pulsed plasma analyzer and method for analyzing the same

Growing community of inventors

Suwon-si, South Korea

Protopopov Vladimir