Lam Research Corporation

Pratik Mankidy

Anthony De La Llera

Gregory R Bettencourt

Rajinder Dhindsa

John Patrick Holland

Harmeet Singh

Michael C Kellogg

Roger Patrick

Takumi Yanagawa

Gautam Bhattacharyya

Sandy Chao

Simon Gosselin Eng

Rajesh Dorai

Rajlnder Dhindsa

Stephan K Piotrowski

Jaewon Kim

Dongjun Wu

Zehua Jin

Ming Li

A plasma lining structure is used in a process chamber to block direct line-of-sight for plasma generated within to grounded surface. The plasma lining structure includes a plurality of sections to cover at least one or more portions of an inside surface of a plasma confinement structure disposed in the process chamber. The sections of the plasma lining structure are positioned between a plasma region and the sidewall of the plasma confinement structure, when the plasma lining structure and the plasma confinement structure are disposed in the plasma chamber, such that the sections directly face the plasma region.

Tunability of edge plasma density for tilt control

Showerhead faceplates for semiconductor processing chambers are provided that include one or more sets of gas distribution passages therethrough that extend at least partially along axes that are at an oblique angle to the showerhead faceplate center axis. Such angled gas distribution passages may be used to tailor the gas flow characteristics of such showerhead faceplates to produce various desired gas flow behaviors in the gas that is delivered to the wafer via such showerhead faceplates.

Showerhead faceplates with angled gas distribution passages for semiconductor processing tools

A thermally and electrically conductive gasket of a gasket set configured to be mounted between a faceplate and backing plate of a showerhead electrode assembly includes an inner gasket configured to be mounted on an inner electrode of a showerhead electrode assembly. The inner gasket includes a plurality of concentric flat rings connected by a plurality of spokes. A first annular gasket surrounds and is concentric with the inner gasket and includes a flat annular ring having a plurality of cutouts. A second annular gasket surrounds and is concentric with the first annular gasket and includes a flat annular ring having a plurality of cutouts. A third annular gasket surrounds and is concentric with the second annular gasket and includes a flat annular ring having a plurality of cutouts. The gasket accommodates gas injection holes, alignment pin holes, an alignment ring groove, and/or threaded holes.

Edge-clamped and mechanically fastened inner electrode of showerhead electrode assembly

An inner electrode of a showerhead electrode assembly useful for plasma etching includes features providing improved positioning accuracy and reduced warping, which leads to enhanced uniformity of plasma processing rate. The assembly can include a thermal gasket set and fasteners such as bolts or cam locks located on a radius of &#xbc; to &#xbd; the radius of the inner electrode. A method of assembling the inner electrode and gasket set to a supporting member is also provided.

A showerhead electrode, a gasket set and an assembly thereof in plasma reaction chamber for etching semiconductor substrates are provided with improved a gas injection hole pattern, positioning accuracy and reduced warping, which leads to enhanced uniformity of plasma processing rate. A method of assembling the inner electrode and gasket set to a supporting member includes simultaneous engagement of cam locks.

Showerhead electrode

A showerhead electrode and assembly useful for plasma etching includes cam locks which provide improved thermal contact between the showerhead electrode and a backing plate. The cam locks include cam shafts in the backing plate which engage enlarged heads of studs mounted on the showerhead electrode. The assembly can include an annular shroud surrounding the showerhead electrode and eight of the cam shafts in the backing plate can be operated such that each cam shaft simultaneously engages a stud on the annular shroud and a stud in an outer row of studs on the showerhead electrode. Another eight cam shafts can be operated such that each cam shaft engages a pair of studs on inner and middle rows of the studs mounted of the showerhead electrode.

Cam-locked showerhead electrode and assembly

An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which is mechanically attached to a backing plate by a series of spaced apart cam locks. A guard ring surrounds the backing plate and is movable to positions at which openings in the guard ring align with openings in the backing plate so that the cam locks can be rotated with a tool to release locking pins extending from the upper face of the showerhead electrode.

Growing community of inventors

Fremont, CA, United States of America

Pratik Mankidy