Applied Materials, Inc.

Pratham Jain

Paul F Ma

Jeffrey W Anthis

Benjamin Schmiege

Lei Zhou

Liqi Wu

Michael Sterling Jackson

Chang Ke

Guoqiang Jian

Methods of depositing a film selectively onto a first substrate surface relative to a second substrate surface are described. The methods include exposing a substrate to a blocking molecule to selectively deposit a blocking layer on the first surface. A layer is selectively formed on the second surface and defects of the layer are formed on the blocking layer. The defects are removed from the blocking layer on the first surface.

Selective deposition defects removal by chemical etch

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Santa Clara, CA, United States of America

Pratham Jain