Promerus, Lcc

Sumitomo Bakelite Company Limited

Merck Patent Gmbh

Tokyo Ohka Kogyo Co., Ltd.

Pramod Kandanarachchi

Larry Funderburk Rhodes

Hendra Ng

Steven J Smith

Kazuyoshi Fujita

Osamu Onishi

Andrew Bell

Edmund Elce

Haruo Ikeda

Brian F Knapp

Pawel Miskiewicz

Toby Cull

Wei Zhang

Chun S Chang

Kotaro Endo

Keita Ishiduka

Miguel Carrasco-Orozco

Tomoyuki Ando

Piotr Wierzchowiec

David Christoph Müller

David Christoph Mueller

Nobuo Tagashira

Lawrence D Seger

Hugh A Burgoon

Cheryl Burns

Sho Kubota

Chad Brick

Paul Evans

Patrick Bradley

Paul J Evans

Keita Tokyo Ohka Kogyo Co Ltd Ishiduka

Kotaro Tokyo Ohka Kogyo Co Ltd Endo

Tomoyuki Tokyo Ohka Kogyo Co Ltd Ando

Kotaro Tokyo Ohka Kogyo Coltd Endo

Steven Smith

Ng Hendra

Embodiments in accordance with the present invention encompass compositions containing one or more polycycloolefinic monomers and at least one multifunctional olefinic monomer which when subjected to a suitable temperature undergoes mass polymerization to provide a three-dimensional insulating article which exhibits hitherto unattainable low dielectric constant and low-loss properties, and very high thermal properties. The compositions of this invention may additionally contain one or more organic or inorganic filler materials, which provide improved thermo-mechanical properties in addition to very low dielectric properties. The compositions are stable at room temperature and undergo mass polymerization only when subjected to suitable higher temperatures generally above 100° C. The compositions of this invention are useful in various applications, including as insulating materials in millimeter wave radar antennas, among others.

Polycyclic-olefinic compositions for low-loss films having improved thermal properties

Embodiments in accordance with the present invention encompass polyamic acid or polyimide polymers containing a reactive maleimide end group as well as photosensitive compositions made therefrom which are useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays. In some embodiments the compositions of this invention are shown to feature excellent hitherto unachievable mechanical properties. The negative images formed therefrom exhibit improved thermo-mechanical properties, among other property enhancements.

Reactive end group containing polyimides and polyamic acids and photosensitive compositions thereof

Embodiments in accordance with the present invention encompass photosensitive compositions containing a base soluble polymer, a latent base catalyst, a photoactive compound and an epoxy crosslinking agent. The compositions are useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays. In some embodiments the compositions of this invention are shown to feature excellent hitherto unachievable mechanical properties. More specifically, the compositions exhibit increased photo speed, higher elongation to break, higher tensile strength and higher glass transitions temperatures than the conventional compositions, among other enhanced properties. Accordingly, the positive images formed therefrom exhibit improved thermo-mechanical properties, among other property enhancements.

Positive tone photosensitive compositions containing amic acid as latent base catalyst

Embodiments encompassing a series of compositions containing photoacid generator (PAG) and a base are disclosed and claimed. The compositions are useful as permanent dielectric materials. More specifically, embodiments encompassing compositions containing a series of copolymers of a variety of norbornene-type cycloolefinic monomers and maleic anhydride in which maleic anhydride is fully or partially hydrolyzed (i.e., ring opened and fully or partially esterified), PAG and a base, which are useful in forming permanent dielectric materials having utility in a variety of electronic material applications, among various other uses, are disclosed.

Permanent dielectric compositions containing photoacid generator and base

Embodiments in accordance with the present invention encompass self-imageable polymer compositions containing a variety of photobase generators which are useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays. The compositions of this invention can be tailored to form positive tone or negative tone images depending upon the intended application in aqueous developable medium. The images formed therefrom exhibit improved properties including low wafer stress and better thermo-mechanical properties, among other property enhancements.

Photoimageable polyolefin compositions containing photobase generators

Embodiments in accordance with the present invention encompass self-imagable polymer compositions containing a variety of photobase generators which are useful for forming films that can be patterned to create structures for microelectronic devices, microelectronic packaging, microelectromechanical systems, optoelectronic devices and displays. The compositions of this invention can be tailored to form positive tone or negative tone images depending upon the intended application in aqueous developable medium. The images formed therefrom exhibit improved properties including low wafer stress and better thermo-mechanical properties, among other property enhancements.

Embodiments encompassing a series of compositions containing polymers of norbornadiene and maleic anhydride monomers which are useful in forming a variety of photopatternable structures are disclosed and claimed. The compositions are useful as permanent dielectric materials. More specifically, embodiments encompassing compositions containing a series of ter- and tetrapolymers of a variety of norbornadiene, maleic anhydride, maleimide and norbornene-type cycloolefinic monomers in which maleic anhydride is fully or partially hydrolyzed (i.e., ring opened and fully or partially esterified), and a photoactive compound are disclosed, which are useful in forming permanent dielectric materials having utility in a variety of electronic material applications, among various other uses.

Polymers derived from norbornadiene and maleic anhydride and use thereof

Embodiments in accordance with the present invention provide for the use of polycycloolefins in electronic devices and more specifically to the use of such polycycloolefins as gate insulator layers used in the fabrication of electronic devices, the electronic devices that encompass such polycycloolefin gate insulator and processes for preparing such polycycloolefin gate insulator layers and electronic devices encompassing such layers.

Gate insulator layer for organic electronic devices

Embodiments in accordance with the present invention provide for the use of polycycloolefins in electronic devices and more specifically to the use of such polycycloolefins as interlayers applied to fluoropolymer layers used in the fabrication of electronic devices, the electronic devices that encompass such polycycloolefin interlayers and processes for preparing such polycycloolefin interlayers and electronic devices.

Interlayer for electronic devices

There is provided a polymer including a structural unit represented by the following Formula (1a), a structural unit represented by the following Formula (1b) and a structural unit represented by the following Formula (1c) (In Formula (1a), n represents 0, 1 or 2. Each of R, R, Rand Rindependently represents a hydrogen atom or an organic group having 1 to 10 carbon atoms. In Formula (1c), Rrepresents an organic group having 1 to 10 carbon atoms.

Polymer, photosensitive resin composition and electronic device

Disclosed herein are various amine treated maleic anhydride containing polymers and compositions thereof, which are useful for forming self-imageable films. In some embodiments, such polymers encompass norbornene-type repeating units and maleic anhydride-type repeating units where at least some of such maleic anhydride-type repeating units are either ring-opened or have been transformed into maleimide repeat units. The films formed from such copolymer compositions provide self imageable, low-k, thermally stable layers for use in microelectronic and optoelectronic devices.

Amine treated maleic anhydride polymers, compositions and applications thereof

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Brecksville, OH, United States of America

Pramod Kandanarachchi