Taiwan Semiconductor Manufacturing Comp. Ltd.

Po-Yao Lin

Shin-Puu Jeng

Shu-Shen Yeh

Ming-Chih Yew

Chin-Hua Wang

Chia-Kuei Hsu

Yu-Sheng Lin

Po-Chen Lai

Che-Chia Yang

Wen-Yi Lin

Feng-Cheng Hsu

Shuo-Mao Chen

Shyue-Ter Leu

Kuang-Chun Lee

Fu-Jen Li

Kuo-Chuan Liu

Li-Ling Liao

Tsung-Yen Lee

Po-Hao Tsai

Po-Yao Chuang

Chia-Hsiang Lin

Cheng-Yi Hong

Chien-Hung Chen

Hsien-Wen Liu

Hsiu-Mei Yu

Chien-Sheng Chen

Jiun Yi Wu

Cheng-Lin Huang

Techi Wong

Chih-Kung Huang

Chia-Jen Cheng

Hui-Chang Yu

Chien Hung Chen

Tsung-Ming Yeh

Yu Chen Lee

Chien-Hung Zordius Chen

Kuo-Ching Hsu

Jing Ruei Lu

Ya-Huei Lee

Tsung-Shu Lin

Meng-Liang Lin

Shih-Ting Hung

Kuo-Chin Chang

Yu-Huan Chen

Shou-Yi Wang

Yi-Hang Lin

Shang-Lun Tsai

Chien-Shen Chen

Chia Kuei Hsu

Yi Hang Lin

Kathy Yan

Sheng-Liang Kuo

Yu-Chen Lee

Ping-Tai Chen

Shin-Puu Zeng

Shyue Ter Leu

Semiconductor devices having improved under-bump metallization layouts and methods of forming the same are disclosed. In an embodiment, a semiconductor device includes an IC die; an interconnect structure coupled to the IC die and including a metallization pattern including a via portion extending through a dielectric layer; a second dielectric layer over the dielectric layer opposite the IC die; and a second metallization pattern coupled to the metallization pattern and including a line portion in the dielectric layer and a second via portion extending through the second dielectric layer; and a UBM over the second metallization pattern and the second dielectric layer, the UBM being coupled to the second metallization pattern, a centerline of the via portion and a second centerline of the second via portion being misaligned with a third centerline of the UBM, the centerline and the second centerline being on opposite sides of the third centerline.

Semiconductor package and method of manufacture

A semiconductor package includes a first die, a second die and a buffer layer. The first die and the second die are stacked on the first die. The buffer layer is disposed on a first sidewall of the second die, wherein a second sidewall opposite to the first sidewall of the second die is flush with a third sidewall of the first die.

Integrated fan-out package having stress release structure

Semiconductor devices and methods of manufacture which utilize lids in order to constrain thermal expansion during annealing are presented. In some embodiments lids are placed and attached on encapsulant and, in some embodiments, over first semiconductor dies. As such, when heat is applied, and the encapsulant attempts to expand, the lid will work to constrain the expansion, reducing the amount of stress that would otherwise accumulate within the encapsulant.

Semiconductor device and method of manufacture

Devices and method for forming a chip package structure including at least one semiconductor die attached to a redistribution structure, a molding compound die frame laterally surrounding the at least one semiconductor die, and a first underfill material portion located between the redistribution structure and the at least one semiconductor die and contacting sidewalls of the at least one semiconductor die and sidewalls of the molding compound die frame. The first underfill material portion may include at least one cut region, in which the first underfill material portion may include a vertically-extending portion having a uniform lateral width and a horizontally-extending portion having a uniform vertical thickness and adjoined to a bottom end of the vertically-extending portion within each of the at least one cut region.

Chip package structure including an underfill material portion comprising a cut region

A semiconductor package includes a semiconductor die, a redistribution circuit structure, a supporting structure and a protective layer. The redistribution circuit structure is located on and electrically coupled to the semiconductor die. The supporting structure is located on an outer surface of the redistribution circuit structure, wherein the supporting structure is overlapped with at least a part of the semiconductor die or has a sidewall substantially aligned with a sidewall of the semiconductor die in a vertical projection on the redistribution circuit structure along a stacking direction of the redistribution circuit structure and the supporting structure. The protective layer is located on the supporting structure, wherein the supporting structure is sandwiched between the protective layer and the redistribution circuit structure.

Semiconductor package and method of manufacturing the same

A package structure is provided. The package structure includes a first conductive pad in a first insulating layer, a conductive via in a second insulating layer directly under the first conductive pad, and a first under bump metallurgy structure directly under the first conductive via. In a first horizontal direction, the conductive via is narrower than the first under bump metallurgy structure, and the first under bump metallurgy structure is narrower than the first conductive pad.

Package structure

A semiconductor structure includes a fan-out package comprising at least one semiconductor die, a redistribution structure including fan-out bonding pads, and a first underfill material portion located between the at least one semiconductor die and the redistribution structure; a packaging substrate comprising chip-side bonding pads; an array of solder material portions bonded to the chip-side bonding pads and the fan-out bonding pads; a second underfill material portion laterally surrounding the array of solder material portions; and at least one buffer block structure located between a respective neighboring pair of solder material portions within the array of solder material portions and between the fan-out package and the packaging substrate, and laterally surrounded by the second underfill material portion.

Buffer block structures for C4 bonding and methods of using the same

A structure includes a first package component including a first conductive pad, and a second package component overlying the first package component. The second package component includes a surface dielectric layer, and a conductive bump protruding lower than the surface dielectric layer. The first conductive bump includes a first sidewall facing away from a center of the first package component, and a second sidewall facing toward the center. A solder bump joins the first conductive pad to the first conductive bump. The solder bump contacts the first sidewall. An underfill is between the first package component and the second package component, and the underfill contacts the second sidewall.

Bump joint structure with distortion and method forming same

A semiconductor structure includes: a substrate; a package attached to a first surface of the substrate, where the package includes: an interposer, where a first side of the interposer is bonded to the first surface of the substrate through first conductive bumps; dies attached to a second side of the interposer opposing the first side; and a molding material on the second side of the interposer around the dies; a plurality of thermal interface material (TIM) films on a first surface of the package distal from the substrate, where each of the TIM films is disposed directly over at least one respective die of the dies; and a heat-dissipation lid attached to the first surface of the substrate, where the package and the plurality of TIM films are disposed in an enclosed space between the heat-dissipation lid and the substrate, where the heat-dissipation lid contacts the plurality of TIM films.

High efficiency heat dissipation using discrete thermal interface material films

A chip package structure is provided. The chip package structure includes a wiring substrate. The chip package structure includes an interposer substrate over the wiring substrate. The interposer substrate includes a redistribution structure, a dielectric layer, a conductive via, and a plurality of first dummy vias, the dielectric layer is over the redistribution structure, the conductive via and the first dummy vias pass through the dielectric layer, the first dummy vias surround the conductive via, and the first dummy vias are electrically insulated from the wiring substrate. The chip package structure includes a chip structure over the interposer substrate. The chip structure is electrically connected to the conductive via, and the chip structure is electrically insulated from the first dummy vias.

Method for forming chip package structure

A semiconductor die package is provided. The semiconductor die package includes a semiconductor die and a package substrate supporting and electrically connected to the semiconductor die. The semiconductor die has a corner. The package substrate includes several conductive lines, and one of the conductive lines under the corner of the semiconductor die includes a first line segment and a second line segment connected to the first line segment. The first line segment is linear and extends in a first direction. The second line segment is non-linear and has a varying extension direction.

Semiconductor die package with conductive line crack prevention design

A chip package structure is provided. The chip package structure includes a wiring substrate. The chip package structure includes a first chip structure over the wiring substrate. The chip package structure includes a heat-spreading lid over the wiring substrate and covering the first chip structure. The heat-spreading lid includes a ring structure and a top plate, the ring structure surrounds the first chip structure, the top plate covers the ring structure and the first chip structure, and the first chip structure has a first sidewall and a second sidewall opposite to the first sidewall.

Chip package structure with lid

Provided is a package structure including a substrate, a stiffener ring, an eccentric die, a lid layer, and a buffer layer. The stiffener ring is disposed on the substrate. The stiffener ring has an inner perimeter to enclose an accommodation area. The eccentric die is disposed within the accommodation area on the substrate. The eccentric die is offset from a center of the accommodation area to close to a first side of the stiffener ring. The lid layer is disposed on the stiffener ring and overlays the eccentric die. The buffer layer is embedded in the lid layer between the first side of the stiffener ring and the eccentric die. The buffer layer has a thickness less than a thickness of the lid layer.

Package structure with buffer layer embedded in lid layer

Semiconductor packages and methods of fabricating semiconductor packages include a package substrate having a recess formed in a surface of the package substrate and at least one channel in a bottom surface of the recess. The recess may be configured to accommodate a semiconductor device located over a surface of an interposer that is bonded to the package substrate. Accordingly, a minimum gap distance may be maintained between the semiconductor device and the package substrate, which may ensure that sufficient underfill material may flow between the semiconductor device and the package substrate and within the at least one channel, thereby improving of the structural coupling between the interposer and the package substrate, and reducing the likelihood of package defects, such as delamination, cracking, and/or popcorn defects.

Semiconductor package with substrate recess and methods for forming the same

A multi-chip device includes a first material within a substrate. The first material has a first coefficient of thermal expansion different than a second coefficient of thermal expansion of the substrate. A first chip overlies a first portion of the first material and a first portion of the substrate. A second chip overlies a second portion of the first material and a second portion of the substrate. The first material is between the first portion of the substrate and the second portion of the substrate.

Multi-chip device and method of formation

Growing community of inventors

Zhudong, Taiwan

Po-Yao Lin