Ta Liang Technology Co., Ltd.

Po-Ching Huang

Chun-Chen Chen

Hsien-Ming Lee

Ching-Tang Hsueh

Disclosed are a detection method and a detection apparatus for a polishing pad of a chemical mechanical polishing device, particularly a detection method and a detection apparatus for detecting a surface of a polishing pad dynamically. An isolation region isolated by a gas to expose the polishing pad is formed by the detecting device, and a detection is performed on the isolation region, such that the chemical mechanical polishing device is capable of detecting the polishing pad without interrupting a manufacturing process and the detection results with more accurate can be achieved. Thereby, the polishing pad can be repaired and replaced more timely.

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Taoyuan, Taiwan

Po-Ching Huang