Taiwan Semiconductor Manufacturing Comp. Ltd.

Po-Chang Huang

Yao-Hwan Kao

Ying Ying Wang

Kuan-Chi Chen

Shellin Liu

Heng-Hsin Liu

Heng-Jen Lee

Disclosed herein is a system and method for producing semiconductor devices using overlays, the method comprising associating one or more patterned overlays with respective ones of reserved regions in a layer template, receiving a layer design based on the layer template, identifying the reserved regions in the layer design, generating a production layer design based on the layer design, the production layer design describing at least one production overlay in one of the reserved regions, and fabricating one or more devices based on the production layer design.

Semiconductor overlay production system and method

System and method for replacing a resist filter in such a manner as to reduce filter-induced wafer defects are described. In one embodiment, the system comprises a filtration system connected to a dispenser, the filtration system comprising a filter; and a switch connected to the filter for selectively connecting the filtration system to throughput one of a first chemical solution and a second chemical solution.

System and method for replacing resist filter to reduce resist filter-induced wafer defects

A wafer edge exposure unit comprises a chuck for supporting a wafer. The chuck is rotatable about a central axis. A plurality of light sources are positioned or movably positionable with a common radial distance from the axis of the rotatable chuck, each light source configured to direct exposure light on a respective edge portion of the wafer simultaneously.

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Taipei, Taiwan

Po-Chang Huang