Unaxis Trading Ag

Unaxis Balzers Limited

Balzers Aktiengesellschaft

Balzers Hochvakuum Ag

Unakis Trading Ag

Pius Grunenfelder

Siegfried Krassnitzer

Walter Haag

Urs Schwendener

Markus Schlegel

Stanislav Kadlec

Martin Dubs

Thomas Eisenhammer

Bernd Heinz

A workpiece is manufactured using a magnetron source that has an optimized yield of sputtered-off material as well as service life of the target. Good distribution values of the layer on the workpiece are obtained that are stable over the entire target service life, and a concave sputter face in a configuration with small target-to-workpiece distance is combined with a magnet system to form the magnetron electron trap in which the outer pole of the magnetron electron trap is stationary and an eccentrically disposed inner pole with a second outer pole part is rotatable about the central source axis.

Method for manufacturing a workpiece using a magnetron sputter source

To optimize the yield of sputtered-off material as well as the service life of the target on a magnetron source, in which simultaneously good attainable distribution values of the layer on the substrate, stable over the entire target service life, a concave sputter face in a configuration with small target-substrate distance d is combined with a magnet system to form the magnetron electron trap in which the outer pole of the magnetron electron trap is disposed stationarily and an eccentrically disposed inner pole with a second outer pole part is developed rotatable about the central source axis

Magnetron sputter source

A method for producing flat panels for TFT or plasma display applications includes forming a sputter source within a sputter coating chamber, the source having at least two electrically mutually isolated stationery bar-shaped target arrangements. A controlled magnet arrangement provided under each target with a time-varying magnetron field.

Method of producing flat panels

A sputter source has at least two electrically mutually isolated stationar bar-shaped target arrangements mounted one alongside the other and separated by respective slits. Each of the target arrangements includes a respective electric pad so that each target arrangement may be operated electrically independently from the other target arrangement. Each target arrangement also has a controlled magnet arrangement for generating a time-varying magnetron field upon the respective target arrangement. The magnet arrangements may be controlled independently from each others. The source further has an anode arrangement with anodes alongside and between the target arrangements and/or along smaller sides of the target arrangements.

Magnetron sputtering source

A sputter source has at least two electrically mutually isolated stationary bar-shaped target arrangements mounted one alongside the other and separated by respective slits. Each of the target arrangements includes a respective electric pad so that each target arrangement may be operated electrically independently from the other target arrangement. Each target arrangement also has a controlled magnet arrangement for generating a time-varying magnetron field upon the respective target arrangement. The magnet arrangements may be controlled independently from each other. The source further has an anode arrangement with anodes alongside and between the target arrangements and/or along smaller sides of the target arrangements.

A plasma generating device to treat substrates in a vacuum chamber, includes a cathode which, at its upper surface, contains the material to be treated in the form of a target. At least one magnetic device is provided at the back side of the target, to generate, in the area of the cathode surface, at least one tunnel-like magnet field which forms tunnel foot poles on the cathode surface, whereby the tunnel-like field extends at least along a part of a horizontal tunnel axis. The magnetic device includes a mechanism for displacing at least one of the tunnel foot poles perpendicular to the horizontal tunnel axis. The magnetic device also includes a fixed first magnetic pole generating device and surrounding, as a closed frame, at least a second magnetic pole generating device which contains the mechanism for displacing the corresponding tunnel foot pole. The second magnetic pole generating device consists of a pair of permanent magnets which are placed on their longitudinal axes parallely pivotable to the target such that, in the area of the cathode surface, a tunnel-like laterally modifiable magnet field is generated.

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Wangs, Switzerland

Pius Grunenfelder