Motorola Corporation

Ping Wang

Robert H Reuss

John M Barden

Lisa K Garling

A method for making bipolar transistors with a first and a second buried collectors that are separated wherein the first and second buried collectors are separated by a p buried layer that is made by depositing a heavily doped boron layer and subsequently diffusing boron from the boron layer into the area between the first and second buried collector.

Method for making buried isolation

A series of oxide growth and etch-back operations is employed to form the isolation region of an MOS device (10). The series of operations forms an oxidation susceptible layer (14) into oxidation resistant areas (21) and oxidation susceptible areas (19) thereby confining the effects of a thermal oxidation procedure to the oxidation susceptible areas (19) of the MOS device (10). The thickness of both the oxidized (19) and non-oxidized regions (21) is reduced. Another oxidation is performed and the oxidized material (19, 21) is thinned.

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Chandler, AZ, United States of America

Ping Wang