Pericom Semiconductor Corporation

Ping Ping Xu

Paul C F Tong

Wensong Chen

Ming-Dou Ker

Zhi Qing Liu

David Kwong

Kwong Shing Lin

Anna Tam

Siu-Weng Simon Wong

Zhiqing Liu

A VDD-to-VSS clamp shunts current from a power node to a ground node within an integrated circuit chip when an electro-static-discharges (ESD) event occurs. A resistor and capacitor in series between power and ground generates a low voltage on a trigger node between the resistor and capacitor when an ESD event occurs. A p-channel transistor with its gate driven by the trigger node turns on, driving a gate node high. The gate node is the gate of an n-channel shunt transistor that shunts ESD current from power to ground. A p-channel feedback transistor terminates the ESD shunt current. The p-channel feedback transistor is connected between power and the trigger node, in parallel with the resistor, and has the gate node as its gate. When a latch up trigger occurs, such as electron injection, voltage drops across an N-well of the resistor is prevented by the parallel p-channel feed-back transistor.

Active ESD shunt with transistor feedback to reduce latch-up susceptibility

A bus switch has reduced input capacitance. Parasitic source-to-well and drain-to-well capacitors are shorted by well-shorting transistors, eliminating these parasitic capacitances. The well-shorting transistors are turned on when the bus-switch transistor is turned on, but are turned off when the bus-switch transistor is turned off and the bus switch isolates signals on its source and drain. The isolated P-well under the bus-switch transistor and the well-shorting transistors is not tied to ground. Instead the isolated P-well is floating when the bus-switch transistor is turned on. When the bus-switch transistor is turned off, the underlying isolated P-well is driven to ground by a biasing transistor in another P-well. Since the isolated P-well has a much lower doping than the N+ source and drain, the capacitance of the well-to-substrate junction is much less than the source-to-well capacitance. Thus input capacitance is reduced, allowing higher frequency switching.

Reduced-capacitance bus switch in isolated P-well shorted to source and drain during switching

Transistors with very thin gate oxides are protected against oxide failure by cascading two or more transistors in series between an output pad and ground. The intermediate source/drain node between the two cascaded transistors is usually floating during an ESD test, delaying snapback turn-on of a parasitic lateral NPN transistor. This intermediate node is used to drive the gate of an upper trigger transistor. A lower trigger transistor has a gate node that is charged by the ESD pulse on the pad through a coupling capacitor. When the coupled ESD pulse turns on the trigger transistors, the trigger transistors turn on a silicon-controlled rectifier (SCR) that is integrated with the trigger transistors.

Stacked-NMOS-triggered SCR device for ESD-protection

ESD protection is provided by local ESD-protection devices between each pad and a common-discharge line (CDL). Each ESD-protection device has p-well or p-substrate taps to a local ground rather than to the CDL, reducing noise coupling from the I/O's through the CDL. Another ESD clamp that bypasses the CDL is provided between each pair of internal power and ground buses. Better protection of core circuits during power-to-ground ESD events is provided by bypassing the CDL since only one ESD clamp rather than two ESD-protection devices must turn on. The ESD clamps and ESD-protection devices can be gate-coupled n-channel transistors with coupling capacitors between the pad and the transistor gate. Devices can also be substrate-triggered transistors or active ESD clamps that include an inverter between a coupling capacitor to the CDL and the n-channel transistor gate.

Direct power-to-ground ESD protection with an electrostatic common-discharge line

A cross-pin electro-static-discharge (ESD) protection device protects against ESD zaps between two I/O pins. Pin A is connected to a drain of a bus-switch transistor and pin B is connected to the transistor's source. An ESD protection device on pin A has an n-channel shunting transistor to an internal ground bus. The gate of the shunting transistor is a cross-gate node that is capacitivly coupled to pin A, and has a leaker resistor to ground. An n-channel cross-grounding transistor has its gate connected to the same cross-gate node, but it connects the internal ground bus to pin B, which is grounded in the pin-to-pin ESD test. An ESD pulse on pin A drives the cross-gate node high, turning on both the shunting transistor and the cross-grounding transistor. The floating internal ground bus is connected to ground by pin B, grounding the substrate of the bus-switch transistor to prevent its turn-on.

Pin-to-pin ESD-protection structure having cross-pin activation

Pin-to-pin electro-static-discharge (ESD) protection is provided for a bus-switch transistor that is connected to I/O pins at its source and drain. A p-type substrate is normally pumped below ground by a substrate bias generator when power is applied. However, during a pin-to-pin ESD test, power and ground are floating. A gate node is pulled high through a coupling capacitor by the ESD pulse. The gate node turns on a shunting transistor to couple the ESD pulse to the floating ground bus. The gate node also turns on a shorting transistor that connects the floating ground bus to the floating substrate. A resistor drains the coupling capacitor to the substrate, rather than to ground. Current is injected into the substrate by the resistor. The snapback voltage is lowered by substrate-triggering.

Growing community of inventors

San Jose, CA, United States of America

Ping Ping Xu