Xilinx, Inc.

Advanced Micro Devices Corporation

Ping-Chin Yeh

Nui Chong

Cheang-Whang Chang

Jae-Gyung Ahn

Zhiyuan Wu

Myongseob Kim

Andy C Wei

William George En

John K Jennings

Mario M Pelella

Amitava Majumdar

Henley Liu

Mark Brandon Fuselier

Qi Lin

Daniel Y Chung

John W Cooksey

Bang-Thu Nguyen

Yun Wu

Hui-Wen Lin

Bei Zhu

Rhesa Nathanael

Da Cheng

Hong-Tze Pan

Li-Wen Chang

Cheng-Whang Chang

Circuits and methods involve an integrated circuit (IC) device, a plurality of application-specific sub-circuits, and a plurality of instances of a measuring circuit. The application-specific sub-circuits are disposed within respective areas of the IC device. Each instance of the measuring circuit is associated with one of the application-specific sub-circuits and is disposed within a respective one of the areas of the device. Each instance of the measuring circuit further includes a ring oscillator and a register for storage of a value indicative of an interval of time. Each instance of the measuring circuit is configured to measure passage of the interval of time based on a first clock signal, count oscillations of an output signal of the ring oscillator during the interval of time, and output a value indicating a number of oscillations counted during the interval of time.

Runtime measurement of process variations and supply voltage characteristics

Integrated circuit (IC) dies and method for manufacturing the same are described herein that mitigate pattern loading effects during manufacture. In one example, the IC includes a die body having a first circuit block separated from an adjacent second circuit block by a buffer zone. The first and second circuit blocks have first and second transistors that are at least partially fabricated from a gate metal layer and disposed immediately adjacent the buffer zone. A dummy structure is formed in the buffer zone and is also at least partially fabricated from the gate metal layer. An amount of gate metal layer material in the dummy structure is selected to mitigate differences in the amount of gate metal layer material in regions of first and second circuit blocks that neighbor each other across the buffer zone.

IC die with dummy structures

Examples described herein provide for methods for semiconductor processing for forming source/drain regions of transistors. An example is a method for semiconductor processing. An etch stop liner is formed in a semiconductor substrate. Forming the etch stop liner includes implanting etch selectivity dopants into the semiconductor substrate. The etch selectivity dopants form at least part of the etch stop liner. A source/drain cavity is formed in the semiconductor substrate. Forming the source/drain cavity includes etching the etch stop liner. Etching the etch stop liner selectively etches the etch stop liner relative to a material of the semiconductor substrate. A source/drain region is epitaxially grown in the source/drain cavity.

Implantation for etch stop liner

In an example implementation, an integrated circuit (IC) includes: a plurality of transistors disposed in a plurality of locations on a die of the IC; conductors coupled to terminals of each of the plurality of transistors; a digital-to-analog converter (DAC), coupled to the conductors, to drive voltage signals to the plurality of transistors in response to a digital input; and an analog-to-digital converter (ADC), coupled to at least a portion of the conductors, to generate samples in response to current signals induced in the plurality of transistors in response to the voltage signals, the samples being indicative of at least one electrostatic characteristic for the plurality of transistors.

In-die transistor characterization in an IC

An integrated circuit structure includes: a semiconductor substrate; a shallow trench isolation (STI) region in the semiconductor substrate; one or more active devices formed on the semiconductor substrate; and a resistor array having a plurality of resistors disposed above the STI region; wherein the resistor array comprises a portion of one or more interconnect contact layers that are for interconnection to the one or more active devices.

Method and design of low sheet resistance MEOL resistors

An integrated circuit ('IC') fabricated on a semiconductor substrate has an active gate structure formed over a channel region in the semiconductor substrate. A dummy gate structure is formed on a dielectric isolation structure. The dummy gate structure and the active gate structure have the same width. A sidewall spacer on the dummy gate structure overlies a semiconductor portion between a strain-inducing insert and the dielectric isolation structure.

Integrated circuit with stress inserts

In one embodiment of the present invention, a field effect transistor device is provided. The field effect transistor device comprises an active area, including a first semiconductor material of a first conductivity type. A channel region is included within the active area. A gate region overlays the channel region, and the first source/drain region and the second source/drain region are embedded in the active area and spaced from each other by the channel region. The first source/drain region and the second source/drain region each include a second semiconductor material of a second conductivity type opposite of the first conductivity type. A well-tap region is embedded in the active area and spaced from the first source/drain region by the channel region and the second source/drain region. The well-tap region includes the second semiconductor material of the first conductivity type. The first source/drain region and the second source/drain region and the well-tap region are epitaxial deposits.

Semiconductor device and method for making the same

A method for forming an integrated circuit with a semiconductor substrate is provided. A gate dielectric is formed on the semiconductor substrate, and a gate is formed on the gate dielectric. Source/drain junctions are formed in the semiconductor substrate adjacent the gate. A facet is formed in at least one of the source/drain junctions of the integrated circuit.

Method and structure for controlling floating body effects

Semiconductor devices with improved transistor performance are fabricated by ion-implanting a dopant into the oxide liner to prevent or substantially reduce dopant out-diffusion from the shallow source/drain extensions. Embodiments include ion implanting a P-type dopant, such as B or BF , using the gate electrode as a mask, to form shallow source/drain extensions, depositing a conformal oxide liner, and ion implanting the P-type impurity into the oxide liner at substantially the same dopant concentration as in the shallow source/drain extensions. Subsequent processing includes depositing a spacer layer, etching to form sidewall spacers, ion implanting to form deep moderate or heavy source/drain implants and activation annealing.

Doped spacer liner for improved transistor performance

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San Jose, CA, United States of America

Ping-Chin Yeh