Powerchip Semiconductor Corporation

Winbond Electronics Corporation

United Microelectronics Corp.

Fujian Jinhua Integrated Circuit Co., Ltd.

Renesas Technology Corp.

Pin-Yao Wang

Liang-Chuan Lai

Masaru Yano

Rex Young

Min-San Huang

Tsai-Yu Huang

Wei-Zhe Wong

Jeng-Huan Yang

Leon Lai

Jeng-Huang Yang

An antifuse device is disclosed. The antifuse device includes a plurality of active regions, a plurality of word lines extending along a first direction and cut through the active regions, a plurality of bit lines and a plurality of source lines extending along a second direction and stride across the active regions. The bit lines and the source lines are arranged alternatively along the first direction. Plural antifuse capacitors are disposed along the source lines and connected between the source lines and the active regions.

Antifuse device and method of operating the same

A semiconductor device with improved generation function of unique information is provided. The semiconductor device includes an integrated circuit designed or fabricated based on a general design condition or manufacturing condition, an input/output circuit, and a unique-information generation circuit to generate unique information of the semiconductor device. The unique-information generation circuit includes a circuit for PUF and a code-generation unit. The circuit for PUF is fabricated based on the design condition or manufacturing condition which is different from the general design condition or manufacturing condition and has a factor which makes variations of circuit components become large. The code-generation unit generates codes based on the output of the circuit for PUF.

Semiconductor device, method of manufacturing the same and generation method of unique information

The memory cell includes a read selection transistor, a program selection transistor, and an anti-fuse capacitor. The read selection transistor has a first terminal coupled to a bit line, a second terminal, and a control terminal coupled to a read word line. The program selection transistor has a first terminal coupled to the second terminal of the read selection transistor, a second terminal coupled to a high voltage control line, and a control terminal coupled to a program word line. The anti-fuse capacitor has a first terminal coupled to the second terminal of the read selection transistor, and a second terminal coupled to a low voltage control line.

Memory cell with a read selection transistor and a program selection transistor

A manufacturing method of a semiconductor memory device is provided. The semiconductor memory device can suppress current leakage generated during a programming action so that the programming action can be executed with high reliability. A flash memory of this invention has a memory array in which NAND type strings are formed. Gates of memory cells in row direction of strings are commonly connected to a word line. Gates of bit line select transistors are commonly connected to a select gate line (SGD). Gates of source line select transistors are commonly connected to a select gate line (SGS). An interval (S4) of the select gate line (SGS) and a gate of a word line (WL) adjacent to the select gate line (SGS) is larger than an interval (S1) of the select gate line (SGD) and a gate of a word line (WL) adjacent to the select gate line (SGD).

Manufacturing method of semiconductor memory device

A non-volatile semiconductor memory device achieving low power consumption and erasing method thereof is provided. The flash memory of the present invention includes a memory array formed with NAND type strings. The memory array includes a plurality of global blocks, one global block includes a plurality of blocks, and one block includes a plurality of NAND type strings. When the block of the selected global block is erased and the next block is in adjacent relationship, electric charge accumulated in one of P-wells is discharged to another one of the P-wells, and then the next selected block is erased. Thus, the electric charge is shared between the adjacent P-wells to achieve low power consumption.

Non-volatile semiconductor memory device and erasing method thereof

A manufacturing method of a semiconductor memory device is provided. The semiconductor memory device can suppress current leakage generated during a programming action so that the programming action can be executed with high reliability. A flash memory of this invention has a memory array in which NAND type strings are formed. Gates of memory cells in row direction of strings are commonly connected to a word line. Gates of bit line select transistors are commonly connected to a select gate line (SGD). Gates of source line select transistors are commonly connected to a select gate line (SGS). An interval (S) of the select gate line (SGS) and a gate of a word line (WL) adjacent to the select gate line (SGS) is larger than an interval (S) of the select gate line (SGD) and a gate of a word line (WL) adjacent to the select gate line (SGD).

A semiconductor memory device is provided, which can suppress current leakage generated during a programming action so that the programming action can be executed with high reliability. A flash memory of this invention has a memory array in which NAND type strings are formed. Gates of memory cells in row direction of strings are commonly connected to a word line. Gates of bit line select transistors are commonly connected to a select gate line (SGD). Gates of source line select transistors are commonly connected to a select gate line (SGS). An interval (S) of the select gate line (SGS) and a gate of a word line (WL) adjacent to the select gate line (SGS) is larger than an interval (S) of the select gate line (SGD) and a gate of a word line (WL) adjacent to the select gate line (SGD).

Semiconductor memory device and manufacturing method thereof

A method of fabricating a non-volatile memory is provided. A substrate having a trench therein for forming a trench device is provided. Then, a doped metal silicide layer is formed on the substrate in the trench. A heating process is performed to form a source/drain area in the substrate under the doped metal silicide layer. Thereafter, a first conductive layer is formed on the doped metal silicide layer to fill up the trench.

Fabricating method of an non-volatile memory

A method for fabricating a semiconductor device is described. The method includes providing a substrate having a trench therein, and a trench device in the trench. The trench device includes two gate structures disposed on the sidewalls of the trench, a doped region in the substrate between the gate structures and an inter-gate dielectric layer disposed on the surface of the gate structures. A thermal treatment process in a nitrogen-containing ambient is performed to remove the native oxide layer formed on the surface of the doped region. Then, a conductive layer is formed to fill in the trench.

Method for fabricating semiconductor device

An anti-punch-through semiconductor device is provided. The anti-punch-through semiconductor device includes a substrate, at least an isolation region and a plurality of trench devices. The trench device is disposed in the substrate. The trench device includes a source/drain region. The source/drain region of the trench device is disposed at the bottom of the trench device. The isolation region is disposed in the substrate and between the source/drain regions of each trench device.

Anti-punch-through semiconductor device

A method of manufacturing self-aligned contact openings is provided. A substrate having a number of device structures is provided and the top of the device structures is higher than the surface of the substrate. A first dielectric layer and a conductive layer are sequentially formed on the surfaces of the substrate and the device structures. Next, a part of the conductive layers on the top and the sidewalls of the device structures is removed and a number of first spacers is formed on the exposed sidewalls of the device structures. The exposed conductive layer and the first dielectric layer are removed by using the first spacer as the mask to expose the substrate. Then, a number of conductive spacers is formed. A number of second spacers is formed on the sidewalls of the conductive spacers.

Method of manufacturing self-aligned contact openings

A method of manufacturing a well pick-up structure of a non-volatile memory is provided. A substrate including a first conductive type well, device isolation structures and dummy memory columns is provided. Each of the dummy memory columns includes a second conductive type source region and a second conductive type drain region. A first interlayer insulating layer with an opening is formed over the substrate, and the opening exposes the two adjacent second conductive type drain regions and the device isolation structure between the two adjacent second conductive type drain regions. A portion of the device isolation structure exposed by the opening is removed, and then a first conductive type well extension doped region is formed in the substrate exposed by the opening. A well pick-up conductive layer is formed in the opening. Dummy bit lines electrically connecting the well pick-up conductive layer are formed over the substrate.

Method of manufacturing well pick-up structure of non-volatile memory

A non-volatile memory including a substrate, a select gate, two floating gates, a control gate, and a doped region is described. The select gate is disposed on the substrate. The two floating gates are disposed on both sides of the select gate, and the top surface of the floating gates is higher than that of the select gate forming a hollow structure on the select gate between the two floating gates. The control gate disposed on the substrate covers the select gate and the two floating gates and fills the hollow structure. The doped region is disposed in the substrate on one side of the two floating gates opposite to the select gate.

Non-volatile memory

A method for fabricating a conductive line is provided. First, a substrate having at least two isolation structures already formed is provided. A first conductive layer is formed between every two isolation structures. Then, a dielectric layer is formed on the substrate. The dielectric layer is patterned to form an opening exposing the first conductive layer. After that, a second conductive layer is formed on the substrate. A portion of the second conductive layer outside the opening is removed to form a conductive line. As the size of the device is getting smaller, the size and the position accuracy of the conductive line would not be limited to the design rules of lithography if the present invention is applied. Therefore, a conductive line is formed to electrically connect semiconductor devices effectively.

Growing community of inventors

Hsinchu, Taiwan

Pin-Yao Wang