Asml Netherlands B.v.

Asml Holding N.v.

Other

Nederlandse Organisatie Voor Toegepast-natuurwetenschappelijk Onderzoek Tno

Agere Systems Guardian Corp.

Singulus Mastering B.v.

Elith LLC

Pieter Willem Herman De Jager

Cheng-Qun Gui

Arno Jan Bleeker

Erwin John Van Zwet

Vadim Yevgenyevich Banine

Johannes Onvlee

Andrey Alexandrovich Nikipelov

Erik Roelof Loopstra

Olav Waldemar Vladimir Frijns

Wouter Joep Engelen

Henri Johannes Petrus Vink

Johannes Jacobus Matheus Baselmans

Karel Diederick Van Der Mast

Huibert Visser

Gosse Charles De Vries

Borgert Kruizinga

Robbert Edgar Van Leeuwen

Richard Alexander George

Leonardus Adrianus Gerardus Grimminck

Antonius Theodorus Anna Maria Derksen

Robert-Han Munnig Schmidt

Jacobus Burghoorn

Johannes Antonius Gerardus Akkermans

Wouter Frans Willem Mulckhuyse

Joost Sytsma

Erik Christiaan Fritz

Theodorus Leonardus Van Den Akker

Eduard Hoeberichts

Petrus Rutgerus Bartraij

Andelko Katalenic

Pieter Kruit

Coen Adrianus Verschuren

Han-Kwang Nienhuys

Kars Zeger Troost

Stanislav Y Smirnov

Mark L Oskotsky

Jozef Petrus Henricus Benschop

Lev Ryzhikov

Jason Douglas Hintersteiner

Anastasius Jacobus Anicetus Bruinsma

Robert D Harned

Erwin Paul Smakman

Teis Johan Coenen

Lambertus Gerardus Maria Kessels

Johan Christiaan Gerard Hoefnagels

Otger Jan Luiten

Rilpho Ludovicus Donker

Lev Sakin

Matthew McCarthy

Peter Spit

Bart Snijders

Robert Albertus Johannes Van Der Werf

Arie Jeffrey Den Boef

Nicolaas Ten Kate

Maurits Van Der Schaar

Patricius Aloysius Jacobus Tinnemans

Joeri Lof

Richard Johannes Franciscus Van Haren

Sander Frederik Wuister

Everhardus Cornelis Mos

Hugo Augustinus Joseph Cramer

Justin Lloyd Kreuzer

Joannes Theodoor De Smit

Franciscus Johannes Joseph Janssen

Jacobus Johannus Leonardus Hendricus Verspay

Hans Van Der Laan

Ramon Pascal Van Gorkom

Antoine Gaston Marie Kiers

Heine Melle Mulder

Mircea Dusa

Willem Jurrianus Venema

Lucas Henricus Johannes Stevens

Yang-Shan Huang

Michael Jozef Mathijs Renkens

Robert Gabriël Maria Lansbergen

Albertus Victor Gerardus Mangnus

Maikel Robert Goosen

Paul Frank Luehrmann

Wilhelmus Patrick Elisabeth Maria Op 't Root

Alexey Olegovich Polyakov

Paul Jacques Van Wijnen

Rudy Jan Maria Pellens

Jacob Fredrik Friso Klinkhamer

Fransiscus Godefridus Casper Bijnen

Erik Marie Jose Smeets

Martinus Hendricus Hendricus Hoeks

Marcus Gerhardus Hendrikus Meijerink

Nora-Jean Harned

Nikolay Nikolaevich Iosad

Yan Ren

Henri Gerard Cato Werij

Frank Bornebroek

Dries Smeets

Pascale Anne Maury

Aukje Arianne Annette Kastelijn

Kees Moddemeyer

Jacobus Burghoom

Marco Cornelis Jacobus Martinus Van Hassel

Sipke Jacob Bijlsma

Vladimir Litvinenko

Apparatuses and methods for charged-particle detection may include a deflector system configured to direct charged-particle pulses, a detector having a detection element configured to detect the charged-particle pulses, and a controller having a circuitry configured to control the deflector system to direct a first and second charged-particle pulses to the detection element; obtain first and second timestamps associated with when the first charged-particle pulse is directed by the deflector system and detected by the detection element, respectively, and third and fourth timestamps associated with when the second charged-particle pulse is directed by the deflector system and detected by the detection element, respectively; and identify a first and second exiting beams based on the first and second timestamps, and the third and fourth timestamps, respectively.

Pulsed charged-particle beam system

A combined enrichment and radioisotope production apparatus comprising an electron source arranged to provide an electron beam, the electron source comprising an electron injector and an accelerator, an undulator configured to generate a radiation beam using the electron beam, a molecular stream generator configured to provide a stream of molecules which is intersected by the radiation beam, a receptacle configured to receive molecules or ions selectively received from the stream of molecules, and a target support structure configured to hold a target upon which the electron beam is incident in use.

Enrichment and radioisotope production

Systems, methods, and programming are described for inspecting a substrate having a pattern imaged thereon, including obtaining a plurality of selected target locations on the substrate, the selected target locations dependent on characteristics of the pattern, scanning the substrate with a plurality of electron beamlets, wherein the scanning includes individually addressing the beamlets to impinge on the selected target locations independently, detecting a reflected or a transmitted portion of the beamlets, and generating images of the selected target locations.

Multi-beam inspection methods and systems

A method includes illuminating a mirror array with light having light amplitudes forming a first greyscale pattern, the mirror array including a number of mirrors and at least two of the mirrors are illuminated with a same amplitude of the light. The method also includes imaging the light with the light amplitudes onto a substrate to create a second greyscale pattern, different than the first greyscale pattern, at the substrate.

Optical maskless

A pick-and-place tool including a plurality of movable holder structures, and a plurality of pick-and-place structures, each holder structure accommodating two or more of the pick-and-place structures, wherein at least one of the two or more pick-and-place structures of a respective holder structure is able to move along a respective holder structure independently from another at least one of the two or more pick-and-place structures of the respective holder structure, and wherein each pick-and-place structure includes a pick-up element configured to pick up a donor component at a donor structure and place the donor component an acceptor structure.

Pick-and-place tool having multiple pick up elements

A radioisotope production apparatus (RI) comprising an electron source arranged to provide an electron beam (E). The electron source comprises an electron injector () and an electron accelerator (). The radioisotope production apparatus (RI) further comprises a target support structure configured to hold a target () and a beam splitter () arranged to direct the a first portion of the electron beam along a first path towards a first side of the target () and to direct a second portion of the electron beam along a second path towards a second side of the target ().

Radioisotope production

An exposure apparatus including: a substrate holder constructed to support a substrate; a patterning device configured to provide radiation modulated according to a desired pattern, the patterning device including a plurality of two-dimensional arrays of radiation sources, each radiation source configured to emit a radiation beam; a projection system configured to project the modulated radiation onto the substrate, the projection system including a plurality of optical elements arranged side by side and arranged such that a two-dimensional array of radiation beams from a two-dimensional array of radiation sources impinges a single optical element of the plurality of optical elements; and an actuator configured to provide relative motion between the substrate and the plurality of two-dimensional arrays of radiation sources in a scanning direction to expose the substrate.

Method and apparatus for direct write maskless lithography

A method of patterning lithographic substrates, the method including using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates, wherein the method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly.

Lithographic method

A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.

Beam delivery apparatus and method

A patterning apparatus, including: a substrate holder constructed to support a substrate; a particle generator configured to generate particles in the patterning apparatus, the particle generator configured to deposit the particles onto the substrate to form a layer of particles on the substrate; and a pattern generator in the patterning apparatus, the pattern generator configured to applying a pattern in the patterning apparatus to the deposited layer of particles.

A photocathode comprises a substrate in which a cavity is formed and a film of material disposed on the substrate. The film of material comprises an electron emitting surface configured to emit electrons when illuminated by a beam of radiation. The electron emitting surface is on an opposite side of the film of material from the cavity.

Electron injector and free electron laser

A method of patterning lithographic substrates that includes using a free electron laser to generate EUV radiation and delivering the EUV radiation to a lithographic apparatus which projects the EUV radiation onto lithographic substrates. The method further includes reducing fluctuations in the power of EUV radiation delivered to the lithographic substrates by using a feedback-based control loop to monitor the free electron laser and adjust operation of the free electron laser accordingly, and applying variable attenuation to EUV radiation that has been output by the free electron laser in order to further control the power of EUV radiation delivered to the lithographic apparatus.

A radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method is disclosed. The radiation modulator for a lithography apparatus may have a plurality of waveguides supporting propagation therethough of radiation having a wavelength less than 450 nm; and a modulating section configured to individually modulate radiation propagating in each of the waveguides in order to provide a modulated plurality of output beams.

Radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method

An injector arrangement for providing an electron beam. The injector arrangement comprises a first injector for providing electron bunches, and a second injector for providing electrons bunches. The injector arrangement is operable in a first mode in which the electron beam comprises electron bunches provided by the first injector only and a second mode in which the electron beam comprises electron bunches provided by the second injector only.

In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator includes a deflector to displace the plurality of beams with respect to an exposure area.

Lithographic apparatus, programmable patterning device and lithographic method

Growing community of inventors

Rotterdam, Netherlands

Pieter Willem Herman De Jager