Asml Netherlands B.v.

Pieter Verhoeff

Pieter Willem Herman De Jager

Coen Adrianus Verschuren

Erwin John Van Zwet

Erwin Paul Smakman

Wouter Frans Willem Mulckhuyse

Robert Albertus Johannes Van Der Werf

An exposure apparatus including: a substrate holder constructed to support a substrate; a patterning device configured to provide radiation modulated according to a desired pattern, the patterning device including a plurality of two-dimensional arrays of radiation sources, each radiation source configured to emit a radiation beam; a projection system configured to project the modulated radiation onto the substrate, the projection system including a plurality of optical elements arranged side by side and arranged such that a two-dimensional array of radiation beams from a two-dimensional array of radiation sources impinges a single optical element of the plurality of optical elements; and an actuator configured to provide relative motion between the substrate and the plurality of two-dimensional arrays of radiation sources in a scanning direction to expose the substrate.

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Den Hoorn Z.H., Netherlands

Pieter Verhoeff