Asml Netherlands B.v.

Pieter Lein Joseph Gunter

Thibault Simon Mathieu Laurent

Ronald Van Der Ham

Ruud Hendrikus Martinus Johannes Bloks

Ivo Adam Johannes Thomas

Gerben Pieterse

Gregory Martin Mason Corcoran

Coen Cornelis Wilhelmus Verspaget

Johannes Henricus Wilhelmus Jacobs

Erik Henricus Egidius Catharina Eummelen

Johan Gertrudis Cornelis Kunnen

Martijn Houben

Sander Catharina Reinier Derks

Marinus Jan Remie

Yuri Johannes Gabriël Van De Vijver

Norbertus Josephus Martinus Van Den Nieuwelaar

Jorge Alberto Vieyra Salas

Bert Dirk Scholten

Victor Manuel Blanco Carballo

Ronald Frank Kox

Marijn Wouters

David Merritt Phillips

Frederik Antonius Van Der Zanden

Casper Roderik De Groot

Rolf Hendrikus Jacobus Custers

Johannes Catharinus Hubertus Mulkens

Martinus Hendrikus Antonius Leenders

Nicolaas Rudolf Kemper

Michel Riepen

Marco Koert Stavenga

Sergei Shulepov

Paulus Martinus Maria Liebregts

Koen Steffens

Marinus Jochemsen

David Bessems

Richard Moerman

Fabrizio Evangelista

Gert-Jan Gerardus Johannes Thomas Brands

Jan Willem Cromwijk

Hua Li

Erik Witberg

Ralph Joseph Meijers

Franciscus Wilhelmus Bell

Marcus Agnes Johannes Smits

Zhenhua Ma

A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.

Lithographic apparatus, support table for a lithographic apparatus and device manufacturing method

An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.

Lithography apparatus, a method of manufacturing a device and a control program

Lithography apparatus and method of manufacturing a device

A fluid handling structure, lithographic apparatus and device manufacturing method are disclosed. According to a disclosed embodiment, the fluid handling structure is configured to confine an immersion fluid in a space between a final element of a projection system and a facing surface during movement of the facing surface relative to the structure, wherein the structure has at least one heater to heat a portion of the facing surface adjacent to the heater, the at least one heater having a fluid heater to heat fluid flow from the structure onto the facing surface, the heater thereby heating the portion.

Fluid handling structure, a lithographic apparatus and a device manufacturing method

A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.

Lithographic apparatus, a method of controlling the apparatus and a device manufacturing method

Growing community of inventors

Weert, Netherlands

Pieter Lein Joseph Gunter