Asml Netherlands B.v.

Pieter Jacob Heres

Patricius Aloysius Jacobus Tinnemans

Franciscus Godefridus Casper Bijnen

Edo Maria Hulsebos

Ralph Brinkhof

Loek Johannes Petrus Verhees

Jorn Kjeld Lucas

Ingrid Margaretha Ardina Van Donkelaar

Norbertus Josephus Martinus Van Den Nieuwelaar

Petrus Franciscus Van Gils

Thomas Augustus Mattaar

Arjan Gijsbertsen

Özer Duman

Rudolf Michiel Hermans

Erik Jansen

István Nagy

A method of determining a mark measurement sequence for an object comprising a plurality of marks, the method including: receiving location data for the plurality of marks that are to be measured; obtaining a boundary model of a positioning device used for performing the mark measurement sequence; and determining the mark measurement sequence based on the location data and the boundary model.

Method of determining a mark measurement sequence, stage apparatus and lithographic apparatus

In a method of controlling a lithographic apparatus, historical performance measurements are used to calculate a process model relating to a lithographic process. Current positions of a plurality of alignment marks provided on a current substrate are measured and used to calculate a substrate model relating to a current substrate. Additionally, historical position measurements obtained at the time of processing the prior substrates are used with the historical performance measurements to calculate a model mapping. The model mapping is applied to modify the substrate model. The lithographic apparatus is controlled using the process model and the modified substrate model together. Overlay performance is improved by avoiding over- or under-correction of correlated components of the process model and the substrate model. The model mapping may be a subspace mapping, and dimensionality of the model mapping may be reduced, before it is used.

Method of controlling a lithographic apparatus and device manufacturing method, control system for a lithographic apparatus and lithographic apparatus

A lithographic technique that involves obtaining values of parameters of a substrate deformation model, wherein the values are based on positional data obtained from an alignment system for a lithographic apparatus; modifying the values using a mapping operation, wherein the mapping operation is based on a correlation found between the parameters and overlay data for a previous set of substrates; and generating, based on the modified values, electronic data adapted to configure the lithographic apparatus.

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Veldhoven, Netherlands

Pieter Jacob Heres