Commissariat a L'energie Atomique

Commissariat &#xc0; L'&#xc9;nergie Atomique Et Aux &#xc9;nergies Alternatives

Alcatel Vacuum Technology France

Pierre-Yves Thro

Philippe Cormont

Olivier Sublemontier

Benoit Barthod

Charlie Vacher

Guy Cheymol

François Champonnois

Martin Schmidt

Alexandre Semerok

Marie Geleoc

Pascal Wodling

Christian Lascoutouna

Christophe Hubert

Francois Brygo

Sergey Fomichev

Dmitry Melyukov

Gilles Ughetto

The invention relates to a method for measuring a ray rof a radiation beam (), characterized in that it comprises the steps according to which a source () of a radiation beam () excites (S) a standard member () via heat, in a periodic manner at a frequency (f), thereby obtaining a periodic thermal excitation of the standard member (); a sensor () measures (S) a periodic thermal response on the part of the standard member, in response to the periodic thermal excitation; a processor () determines (S) a phase shift (&#x3c6;) between the periodic thermal excitation and the periodic thermal response; the source () exciting the standard member for a plurality of frequencies (f) and the processor () determining a phase shift for each frequency (f), and thereby determining a plurality of phase shifts (&#x3c6;); the processor () determines (S) a minimum &#x3c6; min of the phase shift (&#x3c6;) thanks to the plurality of phase shifts determined in this manner, and determines (S) the ray rof the beam () via the following formula: r/g(&#x3c6;) where &#x394; is the thickness of the standard member () and where g is a function dependent on the type of heat radiation beam ().

Contactless method for determining the ray of a beam, corresponding system

The invention concerns a method for laser ablation of a surface coating from a wall, such as a painted wall finish, for example in a nuclear plant to be decontaminated, and a device for implementing said method. The inventive ablation method includes sweeping shots on the coating of at least one pulsed laser beam with a laser beam quality factor Mless than 20, and characterized in that it comprises a direct control of said shots by optical deflection, such that the impact zones (I, I, I,) of said shots on said coating are disjointed or substantially adjacent with minimized overlapping.

Method and device for laser ablation of a surface coating from a wall, such as a coat of paint in a nuclear plant

The present invention relates to a method for characterizing a material using active pyrometry. The material comprises at least one thin surface layer arranged on a thick substrate. The present invention heats the surface (Z) of the material by exposing the material to high-frequency laser pulses, so as to perform a series of temperature increase/decrease thermal cycles, accompanied by a heat build-up from one cycle to the next. The present invention collects the emitted radiation, acquires and processes the signals measured by comparing the measured values to the theoretical values obtained by modelling, so as to obtain thermo-physical properties for characterizing the material. The present invention also relates to a device for implementing the method comprising a high-frequency pulsed laser used as heat source.

Method and device for characterizing, using active pyrometry, a thin-layer material arranged on a substrate

The invention relates to a method and device for photolithography by extreme ultraviolet radiation, using a source resulting from the excitation of plasma by several lasers. The object which is to be photoengraved is displaced behind an irradiation window. The radiation is comprised of N successive current impulses whose surface energy is measured. In particular, each laser emits a quantum of energy having a given duration at each outset. The surface energy of the radiation received by the object in the course of the last N&#x2212;1 pulses is thus added up for an niteration of an iterative method. The photosensitive object is displaced from a distance equal to a fraction 1/N of the width of the irradiation window according to the axis of said translation. The above-mentioned sum is subtracted from the amount of total energy required for the photoengraving method. The remaining amount of energy to be provided in order to achieve the total amount of energy and from there, the remaining pulse quanta number to be produced for an npulse is determined by selecting more particularly the corresponding number of laser sources to be turned on. The lasers thus selected are then triggered in order to deliver a pulse.

Method and device for lithography by extreme ultraviolet radiation

The device comprises a device () for creating an essentially linear target () in an evacuated space where laser beams () are focused, the target being suitable for interacting with the focused laser beams () to emit a plasma emitting radiation in the extreme ultraviolet. A receiver device () receives the target () after it has interacted with the focused laser beams (), and a collector device () collects the EUV radiation emitted by the target (). The focusing elements () for focusing the laser beams on the target () are arranged in such a manner that the laser beams () are focused on the target () laterally, being situated in a common half-space relative to the target () and being inclined at a determined angle lying in the range about 60&#xb0; to about 90&#xb0; relative to a mean collection axis () perpendicular to the target (). The collector device () is disposed symmetrically about the mean collection axis () in the half-space containing the laser beams () focused on the target () and inside a conical space () centered on the mean collection axis () with a vertex situated at the target () and a half-angle at the vertex that is less than the angle of inclination of the focused laser beams () relative to the mean collection axis (). The device is suitable for use as a source for EUV radiation in lithography for fabricating integrated circuits.

Apparatus for generating light in the extreme ultraviolet and use in a light source for extreme ultraviolet lithography

An optical pumping module for a laser including an amplifying medium forming a bar with a circular base, at least one light source for optical pumping of the amplifying medium, and a reflector that surrounds the amplifying medium to send the light, along several passes, towards the amplifying medium and forming a cylinder with a polygonal base. The light source is placed in front of one edge of this cylinder on the opposite side of this edge from the amplifying medium. The optical pumping module may be particularly applicable to laser cutting and welding.

Optical pumping module for a laser comprising a cylindrical reflector with a polygonal base

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Gif-sur-Yvette, France

Pierre-Yves Thro