Societe De Production Et De Recherches Appliquees

U.S. Philips Corporation

Societe De Production Et De Recherches

Pierre Boher

Jean-Louis Stehle

Jean-Philippe Piel

Jean-Pierre Rey

Marc Stehle

Philippe Houdy

Jean-Louise Stehle

Luc Tantart

Michel Luttmann

The invention concerns an ellipsometer comprising: a source () capable of emitting a broadband ray (), a polarizer () for producing a polarised incident beam () adapted to illuminate a sample () according to at least a selected angle; an analyzer () providing an output beam () in response to said reflected beam () and at least a reflecting optical element () arranged between the source () and the sample () and/or between the sample () and the sensor, and capable of focusing the incident beam () and/or the reflected beam () according to a selected spot The ellipsometer further comprises at least a first refracting optical element () arranged between the sample () and the sensor and/or between the source () and the sample () to collect and focus said reflected beam and/or said incident beam, thereby enabling to provide at least a refracting element () and a reflecting element () on either side of the sample () and hence to place the source and the sensor on the same side relative to said spot.

Compact spectroscopic ellipsometer

The invention concerns an ellipsometer comprising a source (S) supplying at least an infrared radiation, a sample-holder (PE), a sensor (D), a first optical system mounted between the source (S) and the sample-holder (PE), so as to illuminate a sample placed on the sample-holder, under oblique view with a polarised light beam and a second optical system mounted between the sample-holder (PE) and the sensor (D) for collecting the light reflected by the sample. The ellipsometer further comprises a blocking device (F ) mounted on the reflection path in the focal plane of the focusing device (M ) of the second optical system, and adapted to block parasite rays (RP) derived from the rear surface (FAR) of the sample and to allow through useful rays (RU) derived from the front surface (FAV) of the sample towards the sensor (D), thereby enabling to obtain a resolution with respect to the sample front and rear surfaces.

High spatial resolution infrared ellipsometer

An ellipsometric metrology apparatus for a sample contained in a chamber. A light source outside the chamber produces the illuminating beam. A polarizing device outside the chamber polarizes the illuminating beam. A window of selected dimensions and features is disposed in a plane substantially parallel to the sample surface and at least partly closes the chamber. A first directing device directs the polarized illuminating beam on to an area of the sample along a first optical path extending from the polarizing device to the area of the sample through the window. The first optical path forms a predetermined oblique angle of incidence relative to the sample surface. A polarization analyzing device is outside the chamber, a second directing device directs the reflected beam resulting from the illumination of the sample by the illuminating beam on to the analyzing device along a second optical path extending from the sample towards the analyzing device through the window. The reflected beam is symmetrical to the illuminating beam relative to a normal to the sample surface. A detecting device detects the output beam transmitted by the analyzing device in order to supply an output signal processing means processes the output signal in order to determine the changes in stage of polarization in phase and in amplitude caused by the reflection on the area of the sample.

Method and apparatus for ellipsometric metrology for a sample contained in a chamber or the like

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Growing community of inventors

Yerres, France

Pierre Boher