Commissariat a L'energie Atomique

Philippe Rambaud

Robert Meyer

Michel Borel

Jean-Francois Boronat

Francois Marion

Pierre Vaudaine

Lydie Mathieu

A method for obtaining layers defined on a hybrid circuit. The hybrid circuit including a substrate and at least one elementary circuit that includes a first facet and a second facet, being hybridized via the second facet to a facet of the substrate. This facet of the substrate and each elementary circuit are coated with a first layer, the first layer is removed from the first facet of the elementary circuit, the first facet and the subsisting part of the first layer are coated with a second layer, and the subsisting part and the second layer covering it are removed. Such a method may, for example, find application to obtaining an antireflection or metal layer on a chip.

Method for producing layers located on a hybrid circuit

A process for the production of microtip electron sources and the products produced thereby. The process includes a first cleaning stage with a first wet chemical cleaning substage and/or a second plasma cleaning substage and a finishing stage using surface etching. A second cleaning stage using a wet chemical cleaning can also be used. The process uses a system of cathode conductors, grids superimposed an intermediate insulator and microtips deposited on the cathode conductors.

Process for the production of a microtip electron source and microtip

Electron source with micropoint emissive cathodes and display means by cathodoluminescence excited by field emission and using said source. Each cathode (5) comprises an electrically conductive layer (22) and micropoints (12) and, according to the invention, a continuous resistive layer (24) is provided between the conductive layer and the micropoints. The display means comprises a cathodoluminescent anode (16) facing the source.

Electron source with micropoint emissive cathodes and display means by

A process of producing a display operating by cathodoluminescence excited by field emission, including forming parallel cathodes on a glass substrate, depositing a silica coating on the cathodes, then a conductive coating and then producing a matrix of holes in the conductive coating and silica coating, depositing on the perforated conductive coating a fourth coating not covering the holes and then depositing on the complete structure a coating of an electron emitting material, eliminating the fourth coating so as to expose the microemitters, forming in the conductive coating grids crossing the cathodes and placing above the grids an anode covered by a cathodoluminescent coating.

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Claix, France

Philippe Rambaud