Agfa Graphics Nv

Agfa Nv

Eco3 Bv

Philippe Moriame

Johan August Loccufier

Hubertus Van Aert

Stefaan Lingier

Tim Desmet

Xavier André

Ludo Vervloet

Rik Vandenbruwaene

Iris Bogunovic

A copolymer includes (i) a plurality of ethylenic moieties A having a structure according to the following formula: wherein Rand Rindependently represent hydrogen, a halogen, or an optionally substituted linear, branched, or cyclic alk(en)yl group, or an optionally substituted aromatic or heteroaromatic, and (ii) a plurality of acetal moieties B having a structure according to the following formula: wherein L represents a divalent linking group; x=0 or 1; and Rrepresents an optionally substituted aromatic or heteroaromatic group including at least one hydroxyl group. Use of these polymers in the coating of lithographic printing plates provides a good abrasion resistance while the balance between the ink acceptance, arising from the ethylenic moieties, and the solubility in an alkaline developer, arising form the acetal moieties, can be controlled efficiently.

(Ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors

A positive-working lithographic printing plate precursor which comprises on a support having a hydrophilic surface or which is provided with a hydrophilic layer, a heat and/or light-sensitive coating comprising an infrared adsorbing agent and a binder including a monomeric unit including a salicylic acid group and a monomeric unit including a sulfonamide group.

Lithographic printing plate precursor

A lithographic printing plate precursor is disclosed which comprises a support having a hydrophilic surface or which is provided with a hydrophilic layer, and a coating thereon, said coating comprising an IR absorbing agent and a contrast enhancing compound, characterized in that said contrast enhancing compound has the structure of formula (I). The printing plate comprising the contrast enhancing compound improves the thermoresponsivity of the coating and is capable of improving the resistance of the coating in the non-exposed areas against the alkaline developer. 

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Antwerp, Belgium

Philippe Moriame