Alcatel

Philippe Maquin

Roland Bernard

Eric Chevalier

Thierry Neel

Patrick Pilotti

Claude Rousseau

A pumping system comprising at least one pump unit () with a vacuum pump casing in which there are multiple pumping stages that includes at least one pumped gas treatment system is provided. The pumped gas treatment system compromises at least one plasma source located inside the vacuum pump casing of the pump unit, to generate a plasma that at least partially decomposes certain gases passing through the pump unit. This reduces the size of the pumped gas treatment system and improves its efficiency so that a gas pumping and treatment system can be created that is sufficiently small as to allow it to be placed in close proximity to the process chambers.

Plasma-based gas treatment system integrated in a vacuum pump

The invention relates to a gas analysis system for analyzing gases in an enclosure under controlled pressure, which system comprises apparatus for ionizing the gases to be analyzed, and apparatus for analyzing the ionized gases. According to the invention the apparatus for ionizing the gases to be analyzed comprises a dedicated plasma source in contact with the gases contained in the enclosure and combined with a generator for generating a plasma from the gases to be analyzed; and the apparatus for analyzing the ionized gases comprises a radiation sensor situated in the vicinity of the zone in which the plasma is generated, and connected to an optical spectrometer for analyzing the variation of the radiation spectrum emitted by the generated plasma.

Method and a system for identifying gaseous effluents, and a facility provided with such a system

The invention relates to a system for regulating the pressure in an enclosure ( ) that is to contain processed gas for manufacturing semiconductor components or micro- or nano-technology devices, the enclosure being connected by pipework ( ) to a pump unit ( ) comprising a dry mechanical primary pump ( ) and at least one secondary pump ( ). According to the invention, the system further comprises a speed controller ( ) controlling simultaneously the speeds of rotation of the dry mechanical primary pump ( ) and of said at least one secondary pump ( ).

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St Jean de Sixt, France

Philippe Maquin