Haag-Streit Ag

Philipp Gloor

Alain Weber

René Mueri

Tobias Nef

Urs Mosimann

René MÜRI

Image exposure in an ophthalmic microscope device is controlled by first recording a camera image with the camera of the microscope using first exposure parameters. Edge detection, e.g., based on convolution using a discrete differential operator, is then used to identify regions where the image has high and low edge densities. A brightness parameter of the camera image is calculated by weighing the pixel brightness in the regions with increased edge density more strongly than in the other regions. The brightness parameter is then used to control the exposure parameters of the microscope.

Image exposure techniques for ophthalmic microscope devices

An eye examining instrument comprises a projection device and a concave screen. The eye examining instrument furthermore comprises a convex reflector, wherein an image can be projected by the projection device onto the convex reflector and reflected by the convex reflector onto the concave screen.

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Wuennewil, Switzerland

Philipp Gloor