International Business Machines Corporation

Swisslitho Ag

Philip Paul

Felix Holzner

Armin W Knoll

Urs T Duerig

Heiko Wolf

Cyrill Kuemin

Jens Hofrichter

Folkert Horst

Colin Rawlings

Michael Zientek

Michal Zientek

A scanning probe nanolithography system comprising a probe to create nanostructures line () by line through writing said nanostructures () pixel by pixel along lines () on a sample. A positioning system is adapted to provide a positioning of the probe at a sequence of predetermined positions to the sample and its surface towards the probe and a control unit () is provided to control the positioning system for positioning the probe for a pixel-wise writing of said lines () through a writing unit. It further comprises a sensor unit adapted to detect a predetermined property of the written nanostructure (), the sensor unit being connected to the control unit to adapt the control signals to be provided to the writing unit for writing the following line () based on the measured signals () of the predetermined property.

Scanning probe nanolithography system and method

An apparatus and method directed to a scanning probe microscopy cantilever. The apparatus includes body and an electromagnetic sensor having a detectable electromagnetic property varying upon deformation of the body. The method includes scanning the surface of a material with the cantilever, such that the body of the cantilever undergoes deformations and detecting the electromagnetic property varying upon deformation of the body of the cantilever.

Scanning probe microscopy cantilever comprising an electromagnetic sensor

The invention notably concerns a method for depositing nano-objects on a surface. The method includes: providing a substrate with surface patterns on one face thereof; providing a transfer layer on said face of the substrate; functionalizing areas on a surface of the transfer layer parallel to said face of the substrate, at locations defined with respect to said surface patterns, such as to exhibit enhanced binding interactions with nano-objects; depositing nano-objects and letting them get captured at the functionalized areas; and thinning down the transfer layer by energetic stimulation to decompose the polymer into evaporating units, until the nano-objects reach the surface of the substrate. The invention also provides a semiconductor device which includes a substrate and nano-objects accurately disposed on the substrate

Accurate deposition of nano-objects on a surface

The invention notably concerns a method for depositing nano-objects on a surface. The method includes: providing a substrate with surface patterns on one face thereof; providing a transfer layer on said face of the substrate; functionalizing areas on a surface of the transfer layer parallel to said face of the substrate, at locations defined with respect to said surface patterns, such as to exhibit enhanced binding interactions with nano-objects; depositing nano-objects and letting them get captured at the functionalized areas; and thinning down the transfer layer by energetic stimulation to decompose the polymer into evaporating units, until the nano-objects reach the surface of the substrate. The invention also provides a semiconductor device which includes a substrate and nano-objects accurately disposed on the substrate.

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Zurich, Switzerland

Philip Paul