Analog Devices,inc.

Philip Judge

Derek F Bowers

Gregory Keith Cestra

Craig Wilson

Michael Lee

Steven Wright

A thin film composition is made from silicon, an insulator such as alumina or silicon dioxide, and at least one additional material such as chromium, nickel, boron and/or carbon. These materials are combined to provide a thin film having a &#x3c1; of at least 0.02 &#x3a9;-cm (typically 0.02-1.0 &#x3a9;-cm), and a TCR of less than &#xb1;1000 ppm/&#xb0; C. (typically less than &#xb1;300 ppm/&#xb0; C.). A sheet resistance of at least 20 k&#x3a9;/&#x25a1; may also be obtained. The resulting thin film is preferably at least 200thick, to reduce surface scattering conduction currents.

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Richmond, United Kingdom

Philip Judge