Applied Materials, Inc.

Philip DiGiacomo

Keith A Miller

Paul Kiely

Sunil Kumar Garg

Rajat Agrawal

A system may be configured to monitor an amount of a gas species in a processing chamber using Optical Emission Spectrometry. The gas measurement may be provided as feedback to a control process that generates a target setpoint for a gas flow controller into the process chamber. This real-time process may increase/decrease the flow rate of the gas in order to maintain a process deposition mode within a transition region between primarily metallic deposition and primarily compound deposition.

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Palo Alto, CA, United States of America

Philip DiGiacomo