Motorola Corporation

Philip Armin Seese

William J Dauksher

Frederick Y Cho

Pawitter Jit Mangat

Pawitter Jit Singh Mangat

John R Joseph

A etcher (,) has an inner chamber (,) that is in communication with a collection chamber (,). A cover (,) is made from a substrate (,) and an outer housing (,). The cover (,) is attached to the etcher (,) so that the substrate (,) is suspended over the inner chamber (,). A recirculating system (,) is used to pass an etchant through a filter, into the inner chamber (,), across the substrate (,), into the collection chamber (,), and into a reservoir.

Method of etching a substrate

A etcher (10) has an inner chamber (22) that is in communication with a collection chamber (17). A cover (33) is made from a substrate (11) and an outer housing (34). The cover (33) is attached to the etcher (10) so that the substrate (11) is suspended over the inner chamber (22). A recirculating system (29) is used to pass an etchant through a filter, into the inner chamber (22), across the substrate (11), into the collection chamber (17), and into a reservoir.

Etching apparatus and method of etching a substrate

A method is disclosed for using a combination of electron beam and photo lithography in making a acoustic wave device. The process is preformed by first using a positive photoresist and electron beam writing to designate the fine lines required in acoustic wave devices. Next, a second photoresist and optical lithography are used to delineate the pad areas.

Growing community of inventors

Phoenix, AZ, United States of America

Philip Armin Seese